Fabrication and characteristics of mesh band-pass filters

Abstract

Grid band-pass filters for 300-, 450-, 600-, and 750-GHz central frequencies are designed and manufactured. Copper and aluminum foil and foil-clad fluoroplastic filters were made by chemical and ionic etching methods, and an aluminum film sputtered on a kapton film was formed by the lift-off lithography method. A gold layer was electrolytically applied on copper grid filters. Characteristics of the filters were measured in the millimeter, submillimeter, and infrared (IR) ranges. Foil filters demonstrate better characteristics at lower frequencies, while filters with sputtered films have better characteristics at upper frequencies. The smallest transmission loss was 0.13 dB. For a stage consisting of four filters, this loss was 0.9 dB. The IR radiation attenuation in a 2.5-to 25-µ m wavelength region was no less than 11 dB per filter.

Drawn metamaterials with plasmonic response at terahertz frequencies

“…Recent demonstrations of exotic structures using metamaterials include electromagnetic cloaks, 1 negative refractive index media, 2 and sub-diffraction limited lenses. 5 The electric response of our metamaterial is tailored via a two-dimensional array of thin metallic wires with subwavelength diameter and pitch. In this paper we report an example of a drawn metamaterial which has potential for inexpensive volume production.…”

Optical response of a cold-electron bolometer array

“…The assembly was mounted on the sam ples holder, which is connected through a heat guide to the mixing chamber of the dilution microcryostat [15]. Radiation incident on the lens from outside passes through the optical window (or emits by a warm cap) and three narrowband quasioptical filters [16], which are located on thermal shields with the temper atures of 100, 4.2, and 0.4 K. The infrared radiation was attenuated by ZITEX tm and FLUOROGOLD tm filters mounted on the 100 and 4.2 K screens, respec tively. The filters attenuate incoming infrared radia tion on the sample holder to about 0.1 μW.…”

Квантовый Отклик Болометра На Основе Структуры СИНИС С Подвешенным Абсорбером

“…Источник представляет собой пленку нихрома на сапфировой подложке. Для устранения фоновой засветки образца между источником и сапфировой линзой, на которой размещался чип, дополнительно помещали диафрагму и полосно-пропускающий фильтр с центральной частой 350 GHz [8] (рис. 4).…”