Extreme ultraviolet scanner with high numerical aperture: obscuration and wavefront description

Winter, Laurens de; Tudorovskiy, Timur; Schoot, Jan van; Troost, Kars; Stinstra, Erwin; Hsu, Stephen; Gruner, Toralf; Mueller, Juergen; Mack, Ruediger; Bilski, Bartosz; Zimmermann, J.; Graeupner, Paul

doi:10.1117/1.jmm.21.2.023801

Cited by 5 publications

(4 citation statements)

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“…Due to the hole in the exit pupil, the wavefront aberrations of the projection optics cannot be described using the wellknown Zernike polynomials any more in a robust way. That is why high-NA aberrations are described using Tatian-Zernike functions which are an orthogonal set of base functions on a ring-like exit pupil [10] [11]. At the same time, they exhibit the same basic properties as the standard Zernike polynomials, see Figure 4.…”

Section: High-na System Design Conceptsmentioning

confidence: 99%

Emergence of next generation EUV optics: status, outlook and future

Golde,

Butscher,

Gräupner

et al. 2023

38th European Mask and Lithography Conference (EMLC 2023)

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Section: High-na System Design Conceptsmentioning

confidence: 99%

Emergence of next generation EUV optics: status, outlook and future

Golde,

Butscher,

Gräupner

et al. 2023

38th European Mask and Lithography Conference (EMLC 2023)

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“…These polynomials form an orthogonal function set on an annulus, and have similar symmetries and relations to imaging responses as the fringe Zernike polynomials. 5 The illuminator provides a high flexibility, utilizing the proven technology with actuated field facet mirrors. To switch from one illumination pupil shape to another setting, the tilt angles of the field facets are adjusted, allowing to address a different set of pupil facets, without light loss.…”

Section: Optics For Euvl At Na = 055mentioning

confidence: 99%

Status and outlook of EUV optics at ZEISS

Zimmermann,

Neumann,

Jürgens

et al. 2023

International Conference on Extreme Ultraviolet Lithography 2023

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“…If a change in the spectral range does not allow the use of the basic system without changing the design parameters, the wish of minimizing the central screening may arise [5]. The following analysis we will direct to understanding the boundary result of central obscuration minimization -how significant it is and whether it is worth striving for.…”

Section: Observed Changes In Mtf Caused By оBscuration Variationmentioning

confidence: 99%

Analysis of image quality requirements for multispectral mirror systems

Uvarova¹,

Бахолдин

2022

Optical Design and Testing XII

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The paper presents an analysis of changes in image quality that occur in optical system with a spectral range shift. A basic system was designed for the visible range with the prospect of receiving objectives operating in the range from UV to IR. In the process of transition from the wavelength of 0,55 μm to 0,2 μm, a dramatic drop for initially diffraction quality system in the Strehl number by 1,5 times was found. However, since this criterion does not represent the features of the image quality drop, both Strehl and other computed image quality parameters (Rayleigh and Marechal criteria) cannot be recommended as universal requirements for systems with an unspecified spectral range. An assessing the multispectral system image quality by MTF is proposed. Based on this, conclusions about the initial requirements for image quality of multispectral systems can be acquired. The conclusions are made based on the experience of designing a Schwarzschild mirror objective with a numerical aperture of 0.8 for the range of 0,21-2 µm.

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Extreme ultraviolet scanner with high numerical aperture: obscuration and wavefront description

Cited by 5 publications

References 0 publications

Emergence of next generation EUV optics: status, outlook and future

Emergence of next generation EUV optics: status, outlook and future

Status and outlook of EUV optics at ZEISS

Analysis of image quality requirements for multispectral mirror systems

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