“…Al, a relatively corrosion-resistant metal, is a widely used electrode material in many electronic devices. Nevertheless, the high work function of Al and its high reactivity to organic materials − make it unfavorable as a cathode material for most organic electronic devices. − For this reason, Al is normally used as a capping metal for lower-work-function metals such as Ba, Ca, or Mg. ,,− Alkali halide interlayers are used to compensate for the high work function of Al through different electronic mechanisms. , Among these interlayer materials, LiF has attracted great interest because the incorporation of an ultrathin film (<1 nm) of LiF drastically improves the performance of photovoltaic cells and OLEDs. ,,,,− Despite the wide band gap of LiF (∼13 eV), which makes it a superior insulating material, an ultrathin LiF film inserted between Al and an organic film enhances the electron injection/extraction.…”