Electronic doping of transition-metal
oxides (TMOs) is typically
accomplished through the synthesis of nonstoichiometric oxide compositions
and the subsequent ionization of intrinsic lattice defects. As a result,
ambipolar doping of wide-band-gap TMOs is difficult to achieve because
the formation energies and stabilities of vacancy and interstitial
defects vary widely as a function of the oxide composition and crystal
structure. The facile formation of lattice defects for one carrier
type is frequently paired with the high-energy and unstable generation
of defects required for the opposite carrier polarity. Previous work
from our group showed that the brucite (β-phase) layered metal
hydroxides of Co and Ni, intrinsically p-type materials in their anhydrous
three-dimensional forms, could be n-doped using a strong chemical
reductant. In this work, we extend the electron-doping study to the
α polymorph of Co(OH)2 and elucidate the defects
responsible for n-type doping in these two-dimensional materials.
Through structural and electronic comparisons between the α,
β, and rock-salt structures within the cobalt (hydr)oxide family
of materials, we show that both layered structures exhibit facile
formation of anion vacancies, the necessary defect for n-type doping,
that are not accessible in the cubic CoO structure. However, the brucite
polymorph is much more stable to reductive decomposition in the presence
of doped electrons because of its tighter layer-to-layer stacking
and octahedral coordination geometry, which results in a maximum conductivity
of 10–4 S/cm, 2 orders of magnitude higher than
the maximum value attainable on the α-Co(OH)2 structure.