2024
DOI: 10.1039/d3nr02663a
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Exploring the degradation of silver nanowire networks under thermal stress by coupling in situ X-ray diffraction and electrical resistance measurements

Laetitia Bardet,
Hervé Roussel,
Stefano Saroglia
et al.

Abstract: During the thermal ramp of a AgNW network, the XRD measurement is sensitive to the bulk of AgNW, whereas the electrical resistance is mainly influenced by AgNW junctions. This enables the observation of differences in thermal transition values.

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Cited by 2 publications
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“…From the TEM observations, the film thickness on Ag nanowires is 5 and 12 nm for the thinnest and intermediate thickness films, respectively. The TEM image in Figure S1a illustrates the monocrystalline nature of AgNW, showcasing distinct planes, 30 while revealing the amorphous structure of the AlN layer. For a better estimation of the thickness of the AlN coating, X-ray reflectivity (XRR) was also used on AlN coatings deposited on glass using the same conditions and the number of ALD cycles as for the coating of the wires (see Figure S2).…”
Section: Resultsmentioning
confidence: 99%
“…From the TEM observations, the film thickness on Ag nanowires is 5 and 12 nm for the thinnest and intermediate thickness films, respectively. The TEM image in Figure S1a illustrates the monocrystalline nature of AgNW, showcasing distinct planes, 30 while revealing the amorphous structure of the AlN layer. For a better estimation of the thickness of the AlN coating, X-ray reflectivity (XRR) was also used on AlN coatings deposited on glass using the same conditions and the number of ALD cycles as for the coating of the wires (see Figure S2).…”
Section: Resultsmentioning
confidence: 99%