Exploring non-stoichiometric SiOx thin film for non-volatile memory application

Laishram, Rubila; Alam, Mir Waqas; Souayeh, Basma; Singh, Naorem Khelchand

doi:10.1016/j.jallcom.2024.173420

Journal of Alloys and Compounds

2024

DOI: 10.1016/j.jallcom.2024.173420

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Exploring non-stoichiometric SiOx thin film for non-volatile memory application

Rubila Laishram,

Mir Waqas Alam,

Basma Souayeh

et al.

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Cited by 5 publications

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Efficient non-volatile memory based on SiOx thin film fabricated on transparent ITO substrate

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Appl. Phys. A

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Efficient non-volatile memory based on SiOx thin film fabricated on transparent ITO substrate

Laishram,

Alam,

Al Saleh Al-Othoum

et al. 2024

Appl. Phys. A

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Role of Ti interfacial layer in the stability of TiO2 based transparent synaptic device

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Exploring non-stoichiometric SiOx thin film for non-volatile memory application

Cited by 5 publications

References 28 publications

Efficient non-volatile memory based on SiOx thin film fabricated on transparent ITO substrate

Efficient non-volatile memory based on SiOx thin film fabricated on transparent ITO substrate

Role of Ti interfacial layer in the stability of TiO2 based transparent synaptic device

The impact of post-deposition annealing durations on the formation of Tb4O7 passivation layer on silicon substrate

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