2022
DOI: 10.1021/acsaelm.2c00604
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Exploration of Phosphorus Oxide in Heavily Phosphorus-Doped Polysilicon Films of Tunneling Oxide Passivation Contact Solar Cells

Abstract: The investigation aims to reveal and confirm the phosphorus (P)–oxygen (O) bonds formed in the poly-Si (n+) film of the TOPCon device, which is beneficial for reducing the resistivity and the potential barriers of grain boundaries (GBs) due to further passivation of GBs within the film. To overcome the difficulty of gaining the chemical components in the interface and bulk of the n-Si/SiO x /poly-Si (n+) materials, we undertake X-ray photoelectron spectroscopy (XPS) with the depth profile by means of argon ion… Show more

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Cited by 3 publications
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“…XPS of phosphorus revealed two peaks in the 2p region, located at 131.2 and 133.4 eV, corresponding to the bonding states of P–C and P–O, respectively (Fig. 5 f) 58 , 59 . Additionally, the XPS plot of the gold 4f area revealed two peaks located at 83.5 and 87.5 eV, both of them conforming to the Au(0) (Fig.…”
Section: Resultsmentioning
confidence: 99%
“…XPS of phosphorus revealed two peaks in the 2p region, located at 131.2 and 133.4 eV, corresponding to the bonding states of P–C and P–O, respectively (Fig. 5 f) 58 , 59 . Additionally, the XPS plot of the gold 4f area revealed two peaks located at 83.5 and 87.5 eV, both of them conforming to the Au(0) (Fig.…”
Section: Resultsmentioning
confidence: 99%