Exploiting Material Resonances to Reduce Losses in Plasmonic Modulators

Haffner, Christian; Heni, Wolfgang; Chelladurai, Daniel; Đorđević, Nikola; Koch, Ueli; Fedoryshyn, Yuriy; Portner, Kevin; Burla, Maurizio; Elder, Delwin L.; Robinson, Bruce H.; Dalton, Larry R.; Leuthold, Juerg

doi:10.1364/noma.2017.nom2c.3

Advanced Photonics 2017 (IPR, NOMA, Sensors, Networks, SPPCom, PS) 2017

DOI: 10.1364/noma.2017.nom2c.3

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Exploiting Material Resonances to Reduce Losses in Plasmonic Modulators

Christian Haffner

Wolfgang Heni

Daniel Chelladurai

et al.

Abstract: We demonstrate a two times reduction of plasmonic modulator loss by exploiting material resonances of organic electro-optic materials. We measure enhanced in-device electro-optic coefficients with record values of r33=325pm/V reducing UπL threefold.

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Exploiting Material Resonances to Reduce Losses in Plasmonic Modulators

Abstract: We demonstrate a two times reduction of plasmonic modulator loss by exploiting material resonances of organic electro-optic materials. We measure enhanced in-device electro-optic coefficients with record values of r33=325pm/V reducing UπL threefold.

Cited by 0 publications

References 11 publications

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