Experimental Study on Formation of the Microstructure on Copper Film Using Ultraviolet Nanosecond Laser

Abstract

In this paper, the ablated microstructures on copper film affected by ultraviolet nanosecond pulse laser are presented. The experimental system was consisted of two lasers, optics and controlling electronics. A 3000mW, 355nm Q-switched ultraviolet lasers was used to the micro-polishing experiments in the work. The repetition rate of the ultraviolet pulse laser is from single-shot to 100kHz, and the pulse width is less than 40ns. The sample used in experiment is copper film (200 nm) sputtered on glass. A series of experiments at different laser parameters and speed of work platform are done. The ablating experiments are also carried out on focusing and defocusing application in the laser direct writer. The results were analyzed.