“…However, for practical application, TiO x thin films are more adequate than powders. Several methods can be used to prepare TiO x thin films, such as blow arc discharge [19], pulsed laser deposition [20], plasma assisted chemical vapor deposition [21,22], plasma surface treatment [23], anodization [24] and reactive magnetron sputtering [25][26][27]. Among these methods, the magnetron sputtering method allows an easy control of the films structure and composition besides provides many advantages in reproducibility, high mechanical durability, strong adhesion and uniformity and it is applicable to large area deposition.…”