Experimental study of the synthesis of fused silica by direct combustion hydrolysis

Linow, Sven; Schneider, Christoph; Geiss, Stefan; Janicka, J.; Hassel, Egon; Rüdiger, Frank

doi:10.1007/s003480200007

Cited by 14 publications

(12 citation statements)

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“…The predicted temperature distribution is consistent with the experimental result in Ref. [7], but the temperature is underestimated about 80 K by model prediction.…”

Section: Numerical Issues and Model Validationsupporting

confidence: 88%

“…The particle number density is predicted by solving the PBE (Equation ). The size range of particles is assumed to be 0 ~100 nm based on the experimental results . The particle size spectrum is divided into three intervals (ie, M = 3) due to its narrow size distribution.…”

Section: Resultsmentioning

confidence: 99%

“…The size range of particles is assumed to be 0 ~100 nm based on the experimental results. 7 The particle size spectrum is divided into three intervals (ie, M = 3) due to its narrow size distribution. Figure 6 shows the predicted particle number density for the case that SiCl 4 is injected from the secondary layer nozzle, which is a function of the axial distance from the burner exit to the substrate surface.…”

Section: Effects Of Sicl 4 Injection Positionmentioning

confidence: 99%

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Formation and optimization of deposition surface shape during fused silica glass synthesis by chemical vapor deposition

Huang

2019

Int J of Appl Glass Sci

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This paper investigates the effects of deposition surface shape on temperature distribution of fused silica glass by SiCl4 chemical vapor deposition and performs the optimization of deposition surface shape to obtain the glass with a small temperature gradient. The computational model is first developed to describe the complicated physical and chemical phenomenon in the system. Numerical simulations are then performed to evaluate the effects of SiCl4 injection position on flame characteristics and SiO2 deposition rate. It is found that the SiO2 deposition rates with the unimodal, uniform, and bimodal distributions are obtained when SiCl4 is injected from the central, secondary layer and fourth layer nozzles, respectively. The deposition surface shape is mainly determined by the gas temperature gradient and particle number density near the deposition surface. Thereafter, the temperature distributions in synthetic silica glass are presented for the cases with convex, flat, and concave deposition surface shapes. Large temperature gradients exist at the side of glass if the convex and concave surfaces are formed, although a high temperature uniformity is obtained in the center of glass for the convex deposition surface. The optimal surface shape that has a very small temperature gradient in glass is obtained by the optimization of deposition surface depth.

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“…The predicted temperature distribution is consistent with the experimental result in Ref. [7], but the temperature is underestimated about 80 K by model prediction.…”

Section: Numerical Issues and Model Validationsupporting

confidence: 88%

Section: Resultsmentioning

confidence: 99%

Section: Effects Of Sicl 4 Injection Positionmentioning

confidence: 99%

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Formation and optimization of deposition surface shape during fused silica glass synthesis by chemical vapor deposition

Huang

2019

Int J of Appl Glass Sci

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“…Organosilicon hexamethyldisiloxane (named HMDSO) is an important precursor for preparation of silica nanoparticles, [1][2][3] thin films, 4,5 and silica glasses [6][7][8] by flame synthesis. During these processes, one key issue is to understand the pyrolysis mechanism of HMDSO.…”

Section: Introductionmentioning

confidence: 99%

Chemical kinetics of hexamethyldisiloxane pyrolysis: A ReaxFF molecular dynamics simulation study

Chen

Wang

et al. 2022

Int J of Chemical Kinetics

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The pyrolysis kinetics of hexamethyldisiloxane (HMDSO) at various temperatures was studied using the reactive force field (ReaxFF) molecular dynamics simulations. Reaction rate constants and the main pyrolysis pathways were explored at the initial decomposition stage of HMDSO and intermediates decomposition stage. The activation energy and pre-exponential factor describing the reaction rate constants were obtained and further validated by experimental data and DFT theoretical calculations. The formation of C 5 H 15 OSi 2 fragment by Si-C bond dissociation was dominant at the initial decomposition stage of HMDSO at the simulation temperatures of 2500-4000 K. The subsequent reaction pathways involved the formation of C 5 H 14 OSi 2 and C 4 H 11 OSi 2 . After that, the pathways were different for 2500 and 3000 K. At 4000 K, small silicon-containing fragments were formed, including CH 3 Si, CH 4 Si, and C 3 H 9 Si, etc. The simulations also revealed that the major hydrocarbons generated during HMDSO pyrolysis were CH 3 and CH 4 . Also, CH 4 formation was more important in the end of HMDSO pyrolysis when simulation temperature was over 3500 K.

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“…In overview, the SiO 2 particles generate in an oxy-hydrogen diffusion flame for the hydrolysis and oxidation reactions of SiCl 4 [1] , transport with the flame flow, and deposit on a rotated target to consolidate to glass finally [2,3] . The bulk glass properties depend on the size and morphology of the particles, since control of which plays an important part in synthetic silica glass production [4] .…”

mentioning

confidence: 99%

Effects of flame temperature and SiCl4 concentration on particle characteristics for synthetic silica glass

Wang

Rao

2010

J. Wuhan Univ. Technol.-Mat. Sci. Edit.

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Experimental study of the synthesis of fused silica by direct combustion hydrolysis

Cited by 14 publications

References 0 publications

Formation and optimization of deposition surface shape during fused silica glass synthesis by chemical vapor deposition

Formation and optimization of deposition surface shape during fused silica glass synthesis by chemical vapor deposition

Chemical kinetics of hexamethyldisiloxane pyrolysis: A ReaxFF molecular dynamics simulation study

Effects of flame temperature and SiCl4 concentration on particle characteristics for synthetic silica glass

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