2007
DOI: 10.1016/j.nima.2007.01.080
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Experimental research of stability of thin films on the basis of depleted uranium as reflecting coating for wavelength of 4.5nm

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Cited by 6 publications
(4 citation statements)
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“…Analysis shows that depleted uranium is a promising material for mirror coatings in the soft X-ray range and the EUV (extreme ultra-violet) region, and uranium thin films can be used in applications such as space telescopes and in multilayer mirrors [1][2][3][4]. Unfortunately, these thin films are highly unstable due to the rapid oxidation of uranium upon removal from vacuum.…”
Section: Introductionmentioning
confidence: 99%
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“…Analysis shows that depleted uranium is a promising material for mirror coatings in the soft X-ray range and the EUV (extreme ultra-violet) region, and uranium thin films can be used in applications such as space telescopes and in multilayer mirrors [1][2][3][4]. Unfortunately, these thin films are highly unstable due to the rapid oxidation of uranium upon removal from vacuum.…”
Section: Introductionmentioning
confidence: 99%
“…This instability in uranium thin films has led to increased interest in uranium oxide thin films because of their stability and high reflectivity in some region of wavelength [2,3]. Experimentally, the optical properties of uranium-based mirrors have been studied since the early 1990s by different research teams [2][3][4][5][6][7][8][9][10][11]. However, at present there is no theoretical report about optical properties of the bulk UO 2 .…”
Section: Introductionmentioning
confidence: 99%
“…Recent analysis shows that uranium is also a promising material for mirror coatings in the soft X-ray range and the extreme ultra-violet (EUV) region, and that uranium thin films can be used in space telescopes and in multilayer mirrors. [1,2] Also, in nuclear industry, in order to evaluate the extent of oxidation for the surface, it is necessary to obtain the thickness of the oxide layer. For some conventional thickness-determination techniques like ellipsometric spectroscopy, optical constants such as refractive indices and extinction coefficients are the necessary parameters.…”
Section: Introductionmentioning
confidence: 99%
“…1 They are widely used in optical systems applied in astrophysics, [2][3][4] x-ray lithography, [5][6][7] x-ray microscopy (including both water [8][9][10][11] and carbon 12,13 windows), microanalysis, [14][15][16] and many other fields of science and technology. Requirements of a high reflectivity for such multilayers (MLs) as a rule define a specific material pair for construction.…”
Section: Introductionmentioning
confidence: 99%