Experimental kinetic study of the chemical vapour deposition of SiC-based ceramics from gas precursor

Loumagne, F.; Langlais, F.; Naslain, R.

doi:10.1016/0022-0248(95)00180-8

Cited by 74 publications

(74 citation statements)

References 6 publications

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“…One is that the temperature generally adopted for CVD lie inside the region, and the other is that the new database [75][76][77][78][79][80][81] is for 298.15-2000 K. The pressures are chosen since 0.6 and 100 kPa are the lower [55] and upper [45] limits of the experimental and theoretical pressures found in the literature, [11, and 6 kPa is the typical experimental pressure used in our group. [83] 10:1 is also the most frequently adopted H 2 /MTS ratio either in experiments [11,31,35,36,38,39,45,46,51,[57][58][59][60] or in theoretical investigations. [11,60,66] As shown in Figure 1, the composition of the condensed phases (Si is not produced under these conditions) is quite sensitive to temperature.…”

Section: Resultsmentioning

confidence: 99%

“…shown that the composition of the condensed phases significantly depends on the molar ratio of H 2 /MTS. This point of view can also be found in many studies, [11,31,33,35,36,41,42,46,52,55,60,66,70,71,86] however most of the work dealt with the problem only in the lower ratio region. For example, ratios up to 10 were studied in a number of papers.…”

Section: Ratios Of H 2 /Mts and Condensed-phase Compositionmentioning

confidence: 89%

“…For example, ratios up to 10 were studied in a number of papers. [31,35,36,41,42,46,52,66] Boisvert [11] investigated ratios smaller than 120. Lim et al [55] tested the ratio in the range 30-50, and William [60] adopted the region up to 1000.…”

Section: Ratios Of H 2 /Mts and Condensed-phase Compositionmentioning

confidence: 99%

See 2 more Smart Citations

Thermodynamics of the Production of Condensed Phases in the CVD of Methyltrichlorosilane Pyrolysis

Deng

Zeng

et al. 2009

Chemical Vapor Deposition

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Production conditions of the condensed phases (b-SiC, silicon, and graphite) in the CVD of methyltrichlorosilane (MTS) pyrolysis are investigated in detail with thermodynamic analyses based on a relatively complete and refined database. Production of the condensed phases is examined as a function of temperature, pressure, and the initial gas ratio of H 2 / MTS. The results show that the composition of the condensed phase is quite sensitive to both temperature and the molar ratio of H 2 /MTS, whereas it is less sensitive to pressure. The ideal conditions for the deposition of b-SiC are temperatures between 1300 and 1500 K, H 2 /MTS ratios between 10 and 10 5 , and with pressures as low as convenient. The co-deposition of C or Si with b-SiC is mainly controlled by the ratio of H 2 /MTS. The co-deposition of C with b-SiC should be in low H 2 /MTS ratios (<10) and the codeposition of Si with b-SiC needs high H 2 /MTS ratios (>10 4 ). The results are in very good agreement with experimental findings and previous theoretical investigations. The present work is also instructive as to the experimental conditions relating to continuous regions of temperatures, pressures, and the H 2 /MTS ratios.

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Section: Resultsmentioning

confidence: 99%

Section: Ratios Of H 2 /Mts and Condensed-phase Compositionmentioning

confidence: 89%

See 1 more Smart Citation

Thermodynamics of the Production of Condensed Phases in the CVD of Methyltrichlorosilane Pyrolysis

Deng

Zeng

et al. 2009

Chemical Vapor Deposition

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“…Some authors were only interested in the deposition rate. [5,7,8,12,13] In some studies, the composition of the deposit was also determined. [11,22,23] Other studies were concerned with the gas phase chemistry.…”

Section: Introductionmentioning

confidence: 99%

“…[1,2] Deposition rate, gas phase composition as well as composition and structure of the deposit were determined in a single study. [3] Deposition rates have been studied using a thermobalance [8,9,12,13,34,35] or a flow reactor. [1±5,7,19,29,36] In both cases hot-wall [1±5,7±9,12,13,19,29,34,36] or cold-wall reactors [21] were used.…”

Section: Introductionmentioning

confidence: 99%

CVD of SiC from Methyltrichlorosilane. Part I: Deposition Rates

Zhang

Hüttinger²

2001

Chem. Vap. Deposition

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The CVD of silicon carbide from methyltrichlorosilane (MTS) was studied at various surface area/volume ratios, using an MTS/H 2 mixture of 1:4. The total pressure was 90 kPa; the temperature was varied from 800 C to 1100 C at residence times of 0.9 s and 0.4 s. Steady-state deposition rates were determined as a function of reactor length. The deposition rate as a function of temperature, investigated at a low surface area/volume ratio, shows strong and weak intermediate maxima at temperatures of about 900 C and 1025 C, respectively. These maxima decrease at increasing surface area/volume ratio, leading to a continuous increase of the deposition rate at a sufficiently high surface area/volume ratio. A chemical model based on analyses of the deposits and the gas phase compositions is presented in Part II.

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Kinetic Investigation on the Deposition of SIC from Methyltrichlorosilane and Hydrogen

Cheng

Zhao

et al. 2010

Ceramic Transactions Series

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Experimental kinetic study of the chemical vapour deposition of SiC-based ceramics from gas precursor

Cited by 74 publications

References 6 publications

Thermodynamics of the Production of Condensed Phases in the CVD of Methyltrichlorosilane Pyrolysis

Thermodynamics of the Production of Condensed Phases in the CVD of Methyltrichlorosilane Pyrolysis

CVD of SiC from Methyltrichlorosilane. Part I: Deposition Rates

Kinetic Investigation on the Deposition of SIC from Methyltrichlorosilane and Hydrogen

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