Experimental investigation of virtual cathode sheath in the presence of secondary electrons produced by streaming ions

Li, Wei; X., J.; Li, Jing-ju; Wei, Zhuangzhuang

doi:10.1063/1.4769117

Cited by 7 publications

(3 citation statements)

References 28 publications

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“…Hence the dust density can be assumed as primary electron density. In such a case, the solution for the virtual cathode should be similar to that of observed in the ambient plasma …”

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confidence: 76%

“…In a very recent paper, Rathod et al have studied the potential profile near the virtual cathode in the presence of charged dust. The virtual cathode formation in a plasma sheath region of an emitting cathode is an interesting topic and has been studied theoretically and experimentally . In the manuscript, authors have studied the role of charged dust particles to the potential profile of a virtual cathode.…”

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confidence: 99%

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Comment on “Potential profile near the virtual cathode in presence of charged dust”

Choudhary

2019

Contributions to Plasma Physics

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The characteristics of the virtual cathode and its potential profile in the presence of negatively charged dust particles have been reported by Rathod et al. They have studied the role of charged dust particles in the formation of virtual cathode near the emitting surface. Two conditions of the dust charge number, Z d = 1 and Z d = 1,000 are used to study the role of dust density (n d ) for the formation of virtual cathode.This work is original and will be more interesting in case of using the correct model equations and realistic dusty plasma conditions. K E Y W O R D Sdouble layer, dust charging, emitting cathode, plasma sheath, virtual cathodeThis is an open access article under the terms of the Creative Commons Attribution License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited.

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“…Hence the dust density can be assumed as primary electron density. In such a case, the solution for the virtual cathode should be similar to that of observed in the ambient plasma …”

mentioning

confidence: 76%

mentioning

confidence: 99%

Comment on “Potential profile near the virtual cathode in presence of charged dust”

Choudhary

2019

Contributions to Plasma Physics

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“…[1][2][3][4][5][6][7][8][9][10][11][12] The regimes of chaotic synchronization in such systems have wide practical applications, for example, for creation of a powerful array of microwave oscillators, secure information transmission, and control of chaos in the microwave devices. [13][14][15][16][17][18][19][20][21][22][23] Several types of the synchronous behavior in coupled chaotic beam-plasma systems are known at present. They are the phase synchronization, complete synchronization, generalized synchronization, and time scale synchronization.…”

Section: Introductionmentioning

confidence: 99%

Amplification through chaotic synchronization in spatially extended beam-plasma systems

Москаленко

Frolov

Короновский

et al. 2017

Chaos: An Interdisciplinary Journal of Nonlinear Science

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In this paper, we have studied the relationship between chaotic synchronization and microwave signal amplification in coupled beam-plasma systems. We have considered a 1D particle-in-cell numerical model of unidirectionally coupled beam-plasma oscillatory media being in the regime of electron pattern formation. We have shown the significant gain of microwave oscillation power in coupled beam-plasma media being in the different regimes of generation. The discovered effect has a close connection with the chaotic synchronization phenomenon, so we have observed that amplification appears after the onset of the complete time scale synchronization regime in the analyzed coupled spatially extended systems. We have also provided the numerical study of physical processes in the chain of beam-plasma systems leading to the chaotic synchronization and the amplification of microwave oscillations power, respectively.

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Numerical solutions of sheath structures in front of an electron-emitting electrode immersed in a low-density plasma

Din

2013

Physics of Plasmas

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The exact theoretical expressions involved in the formation of sheath in front of an electron emitting electrode immersed in a low-density plasma have been derived. The potential profile in the sheath region has been calculated for subcritical, critical, and supercritical emissions. The potential profiles of critical and supercritical emissions reveals that we must take into account a small, instead of zero, electric field at the sheath edge to satisfy the boundary conditions used to integrate the Poisson's equation. The I-V curves for critical emission shows that only high values of plasma-electron to emitted-electron temperature ratio can meet the floating potential of the emissive electrode. A one-dimensional fluid like model is assumed for ions, while the electron species are treated as kinetic. The distribution of emitted-electron from the electrode is assumed to be half Maxwellian. The plasma-electron enters the sheath region at sheath edge with half Maxwellian velocity distribution, while the reflected ones have cut-off velocity distribution due to the absorption of super thermal electrons by the electrode. The effect of varying emitted-electron current on the sheath structure has been studied with the help of a parameter G (the ratio of emitted-electron to plasma-electron densities).

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Experimental investigation of virtual cathode sheath in the presence of secondary electrons produced by streaming ions

Cited by 7 publications

References 28 publications

Comment on “Potential profile near the virtual cathode in presence of charged dust”

Comment on “Potential profile near the virtual cathode in presence of charged dust”

Amplification through chaotic synchronization in spatially extended beam-plasma systems

Numerical solutions of sheath structures in front of an electron-emitting electrode immersed in a low-density plasma

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