Experimental investigation of free and bounded presheaths in weakly magnetized plasmas

Kang, In Je; Bae, Min-Keun; Lho, T.; Chung, Kyu‐Sun

doi:10.1016/j.cap.2016.12.016

Cited by 9 publications

(7 citation statements)

References 28 publications

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“…T e is obtained from the slope of the IV characteristic curve, and n e can be determined from the ion saturation current (I sat = αn e eA s √ KT e /m i ) with an assumption of T e T i at non-thermal plasma, where α, e, A s and K are coefficients for the collective ion saturation current, electron charge, sheath area and Boltzmann constant, respectively. A s ≈ A p (probe tip area 2 × 10 −4 cm 2 ) is assumed and α ≈ 0.61 is used for un-magnetized plasmas [19,20]. To reduce the signal uncertainty, two cylindrical probes are used, as shown in Figure 3.…”

Section: Methodsmentioning

confidence: 99%

Investigation of Compact Hollow-Anode Discharge Source for Copper Thin Films by Sputtering Processes

et al. 2021

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A compact hollow-anode discharge (HAD) source with a size of 60 mm in radius and 70 mm in length has been developed to stably generate plasma jets for various sputtering processes in semiconductor and display fabrications. A developed HAD plasma source has been investigated by cylindrical electric probes, and the experimental results were compared to the values of numerical calculations. A uniform density discharge model with a geometry factor was proposed to estimate the profiles of plasma parameters. Owing to the difference of absolute magnitude, even with the similar trend of spatial variation, plasma parameters such as electron temperature (Te) and plasma density (ne) measured at z = 3 cm have been calibrated by the values of numerical calculations at the nozzle entrance (z = 0 cm, at the throat of the jet), and the calibration factors for Te and n0 have been deduced by comparing the experimental values to numerical calculations. These are to be explained by the decay mechanism along the axis of the jet with elastic collisions in terms of the mean free path. The developed HAD plasma source was tested for the deposition of Cu thin films with an optimized condition as a plausible application to sputtering processes.

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Section: Methodsmentioning

confidence: 99%

Investigation of Compact Hollow-Anode Discharge Source for Copper Thin Films by Sputtering Processes

et al. 2021

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“…DiPS with a plasma gun can produce plasma parameters at edge-relevant plasma, as shown in table 1. It has a magnetic nozzle for the formation of a magnetic hill and geometrical production of a bounded presheath, which experimentally induces a more similar environment with the magnetized plasma at the SOL region in the fusion device [26]. Figure 1 shows the…”

Section: Methodsmentioning

confidence: 99%

“…DiPS has been performed for experimental simulations of the investigation of electron and ion profiles with a LaB 6 DC plasma gun for plasma diagnostics and determining the characteristics of magnetized plasma focused on fusion devices [24,25]. Recently, we have upgraded DiPS to improve the similarity of the plasma condition with a scrape-off layer (SOL) region in fusion devices and performed experiments on the analysis of diffusion phenomena in presheaths as studies on the fusion plasma edge transport [26].…”

Section: Introductionmentioning

confidence: 99%

Estimation of plasma density perturbation from dusty plasma injection by laser irradiation on tungsten target in DiPS

Kang

Bae

Park

et al. 2019

Plasma Sci. Technol.

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To investigate the interaction of dusty plasma with magnetized plasmas at divertor plasma simulator, radial profiles of plasma density (n e ) and electron temperature were measured in terms of plasma discharge currents and magnetic flux intensity by using a fast scanning probes system with triple tips. Dusty plasma with dusts (a generation rate of 3 μg s −1 and a size of 1-10 μm) was produced via interactions between a high-power laser beam and a full tungsten target. As n e increases, the scale of the effects of dusty plasma injection on magnetized plasmas was decreased. Also, the duration of transient fluctuation was reduced. For numerical estimation of plasma density perturbation due to dusty plasma injection, the result was ∼10% at a core region of the magnetized plasma with n e of (2-5)×10 11 cm −3 at steady state condition.

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“…Figure 5 and Table 1 show the results of the current densities calculated using Equation (9) with pressure variation, which was used to calculate the ratio of upstream to downstream current densities. Using various models [ 15 , 16 , 17 , 18 , 19 , 20 , 21 ] with Equations (8) and (9) for the plasma flow velocity,

was defined as

…”

Section: Measurement Of Plasma Flowmentioning

confidence: 99%

Characteristics of Plasma Flow for Microwave Plasma Assisted Aerosol Deposition

et al. 2021

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To validate the possibility of the developed microwave plasma source with a novel structure for plasma aerosol deposition, the characteristics of the plasma flow velocity generated from the microwave plasma source were investigated by a Mach probe with pressure variation. Simulation with the turbulent model was introduced to deduce calibration factor of the Mach probe and to compare experimental measurements for analyses of collisional plasma conditions. The results show calibration factor does not seem to be a constant parameter and highly dependent on the collision parameter. The measured plasma flow velocity, which witnessed fluctuations produced by a shock flow, was between 400 and 700 m/s. The optimized conditions for microwave plasma assisted aerosol deposition were derived by the results obtained from analyses of the parameters of microwave plasma jet. Under the optimized conditions, Y2O3 coatings deposited on an aluminum substrate were investigated using scanning electron microscope. The results presented in this study show the microwave plasma assisted aerosol deposition with the developed microwave plasma source is highly feasible for thick films with >50 μm.

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Experimental investigation of free and bounded presheaths in weakly magnetized plasmas

Cited by 9 publications

References 28 publications

Investigation of Compact Hollow-Anode Discharge Source for Copper Thin Films by Sputtering Processes

Investigation of Compact Hollow-Anode Discharge Source for Copper Thin Films by Sputtering Processes

Estimation of plasma density perturbation from dusty plasma injection by laser irradiation on tungsten target in DiPS

Characteristics of Plasma Flow for Microwave Plasma Assisted Aerosol Deposition

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