2010
DOI: 10.1007/s11434-010-4037-z
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Experimental and theoretical investigation of zinc diffusion in N-GaSb

Abstract: Zinc diffusion process in N-GaSb was studied with excessive, appropriate and insufficient quantity of diffusion source (zinc pellets). Kink-and-tail type zinc concentration profiles obtained with appropriate zinc pellets quantity were successfully simulated using the assumption that the vacancy mechanism mediated by V 0 Ga and kick-out mechanism mediated by I + Ga take effect at the same time. It is found out that for diffusion temperature from 460°C to 500°C, the zinc surface concentration of the diffused sam… Show more

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Cited by 9 publications
(5 citation statements)
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References 15 publications
(17 reference statements)
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“…The carrier for wafers and diffusion sources is a pseudo-closed box made of quartz. The graphite box we used previously [12] is not chosen here because it can easily pollute the diffusion furnace. The carrier was placed in the center of a small sized OTF-1200X tube furnace.…”
Section: Experimental Procedures For Zn Diffusionmentioning
confidence: 99%
See 1 more Smart Citation
“…The carrier for wafers and diffusion sources is a pseudo-closed box made of quartz. The graphite box we used previously [12] is not chosen here because it can easily pollute the diffusion furnace. The carrier was placed in the center of a small sized OTF-1200X tube furnace.…”
Section: Experimental Procedures For Zn Diffusionmentioning
confidence: 99%
“…The resulting Zn diffusion profiles in the n-GaInAsSb were obtained using a CAMECA IMS4F secondary ion mass spectrometer (SIMS). for n-GaSb [12,13]. All the Zn profiles obtained under pure Zn conditions are not suitable for fabricating GaInAsSb cells directly because the lifetime of minority carriers is extremely short in the "dead region"; precise etching processes are necessary.…”
Section: Experimental Procedures For Zn Diffusionmentioning
confidence: 99%
“…Modeling of the experimental impurity profiles using continuum theoretical calculations are also reported in ref [21] . Zn diffusion in GaSb is investigated in ref [22] and Kink-and-tail type diffusion profiles are resulted. A substitutional-interstitial-diffusion (SID) mechanism is proposed in ref [23] for diffusion of chromium in GaAs.…”
Section: Introductionmentioning
confidence: 99%
“…Because Zn profile in GaSb after diffusion exerts a significant influence on the performance of the devices, it is necessary to understand the diffusion mechanism of Zn in GaSb to strictly control the diffusion process. In the past four decades, a great deal of work has been carried out studying the diffusion of Zn into GaSb [7][8][9][10][11][12][13][14][15][16][17]. According to the published work, the boundary condition at the wafer surface plays a key role in modeling the Zn concentration profiles.…”
Section: Introductionmentioning
confidence: 99%