Experimental and numerical studies of tungsten line growth in laser chemical vapor deposition

Ning, Bo; Xia, Tian; Tong, Zi-Xiang

doi:10.1016/j.ijheatmasstransfer.2019.06.001

Cited by 4 publications

(4 citation statements)

References 39 publications

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“…On the other hand, the rate of chemical reactions usually increases with increasing the pressure of the system. Overall, nucleation in the gaseous stage is homogeneous, whereas it is heterogeneous on the substrate surface [69][70][71][72][73][74].…”

Section: Deposition Mechanism In the Cvd Processmentioning

confidence: 99%

“…Generally, the basic steps in the CVD process can be classified as follows [71][72][73][74][75]: produced and the substrate. At very high temperatures, where the amount of supersaturation is high and the reactant gases are very hot, the nucleation rate is homogeneous in the CVD process, thereby precipitating solid particles on the hot substrate.…”

Section: Deposition Mechanism In the Cvd Processmentioning

confidence: 99%

“…Generally, the basic steps in the CVD process can be classified as follows [71][72][73][74][75]: (a) Heat transfer and diffusion of the reactants from the gas reservoir to the reaction zone.…”

Section: Deposition Mechanism In the Cvd Processmentioning

confidence: 99%

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A Review on Sustainable Manufacturing of Ceramic-Based Thin Films by Chemical Vapor Deposition (CVD): Reactions Kinetics and the Deposition Mechanisms

et al. 2023

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Chemical vapor deposition (CVD) is a process that a solid is formed on a substrate by the chemical reaction in the vapor phase. Employing this technology, a wide range of materials, including ceramic nanocomposite coatings, dielectrics, and single crystalline silicon materials, can be coated on a variety of substrates. Among the factors influencing the design of a CVD system are the dimensions or geometry of the substrate, substrate temperature, chemical composition of the substrate, type of the deposition process, the temperature within the chamber, purity of the target material, and the economics of the production. Three major phenomena of surface reaction (kinetic), diffusion or mass transfer reaction, and desorption reaction are involved during the CVD process. Thermodynamically, CVD technology requires high temperatures and low pressures in most systems. Under such conditions, the Gibbs free energy of the chemical system quickly reaches its lowest value, resulting in the production of solids. The kinetic control of the CVD technology should always be used at low temperatures, and the diffusion control should be done at high temperatures. The coating in the CVD technology is deposited in the temperature range of 900–1400 °C. Overall, it is shown here that by controlling the temperature of the chamber and the purity of the precursors, together with the control of the flow rate of the precursors into the chamber, it is possible to partially control the deposition rate and the microstructure of the ceramic coatings during the CVD process.

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Section: Deposition Mechanism In the Cvd Processmentioning

confidence: 99%

Section: Deposition Mechanism In the Cvd Processmentioning

confidence: 99%

See 1 more Smart Citation

A Review on Sustainable Manufacturing of Ceramic-Based Thin Films by Chemical Vapor Deposition (CVD): Reactions Kinetics and the Deposition Mechanisms

et al. 2023

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“…), laser beam machining [9], focused ion beam machining [10,11], electro-discharge machining [12], and chemical/electrochemical machining [13,14], etc. The additive-M 4 processes produce the objects by depositing materials typically layer by layer and include electrochemical deposition (ECD) [15], electroless plating [16,17], focused-ion beam induced deposition (FIBID) [18], laser-chemical vapor deposition (LCVD) [19], etc. The additive-M 4 processes are increasingly attractive since they can flexibly create geometric shapes and controllably tailor the material performances synchronously.…”

Section: Introductionmentioning

confidence: 99%

Concurrently Fabricating Precision Meso- and Microscale Cross-Scale Arrayed Metal Features and Components by Using Wire-Anode Scanning Electroforming Technique

Ming

Zhang

et al. 2023

Micromachines

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In order to improve the thickness uniformity of the electroformed metal layer and components, a new electroforming technique is proposed—wire-anode scanning electroforming (WAS-EF). WAS-EF uses an ultrafine inert anode so that the interelectrode voltage/current is superimposed upon a very narrow ribbon-shaped area at the cathode, thus ensuring better localization of the electric field. The anode of WAS-EF is in constant motion, which reduces the effect of the current edge effect. The stirring paddle of WAS-EF can affect the fluid flow in the microstructure, and improve the mass transfer effect inside the structure. The simulation results show that, when the depth-to-width ratio decreases from 1 to 0.23, the depth of fluid flow in the microstructure can increase from 30% to 100%. Experimental results show that. Compared with the traditional electroforming method, the single metal feature and arrayed metal components prepared by WAS-EF are respectively improved by 15.5% and 11.4%.

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Laser pyrolysis in papers and patents

2021

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This paper presents a critical review of laser pyrolysis. Although this technology is almost 60 years old, in literature many researchers, both from academia and industry, are still developing and improving it. On the contrary industrial applications are struggling to take off, if not in very restricted areas, although the technology has undoubted advantages that justify future development. The aim of this work consists in analysing a representative pool of scientific papers (230) and patents (121), from the last 20 years, to have an overview about the evolution of the method and try to understand the efforts spent to improve this technology effectively in academia and in industry. This study is important to provide a complete review about the argument, still missing in the literature. The objective is to provide an overview sufficiently broad and representative in the sources and to capture all the main ways in which laser pyrolysis has been used and with what distribution. The main focuses of the study are the analyses of the functions carried out by laser technologies, the application fields, and the types of used laser (i.e. models, power and fluence). Among the main results, the study showed that the main use of laser pyrolysis is to produce nanoparticles and coatings, the main materials worked by laser pyrolysis are silicon and carbon dioxide and the main searched properties in the products of laser pyrolysis are catalysts activity and electrical conductivity. CO2 lasers are the most used and the have high versatility compared to others. In conclusion, the study showed that laser pyrolysis is a consolidated technology within its main application fields (nanoparticles and coatings) for several years. Within this context, the technology has been developed on very different sizes and processes, obtaining a very wide range of results. Finally, these results may also have stimulated new areas of experimentation that emerged mainly in recent years and which concern biomedical applications, additive manufacturing, and waste disposal. Graphical abstract

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Experimental and numerical studies of tungsten line growth in laser chemical vapor deposition

Cited by 4 publications

References 39 publications

A Review on Sustainable Manufacturing of Ceramic-Based Thin Films by Chemical Vapor Deposition (CVD): Reactions Kinetics and the Deposition Mechanisms

A Review on Sustainable Manufacturing of Ceramic-Based Thin Films by Chemical Vapor Deposition (CVD): Reactions Kinetics and the Deposition Mechanisms

Concurrently Fabricating Precision Meso- and Microscale Cross-Scale Arrayed Metal Features and Components by Using Wire-Anode Scanning Electroforming Technique

Laser pyrolysis in papers and patents

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