Laser 3D Manufacturing VIII 2021
DOI: 10.1117/12.2579245
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Expansion of direct laser writing capabilities for usage in biomedical applications

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Cited by 4 publications
(3 citation statements)
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“…[ 38 ] The main light source in this setup was a femtosecond laser “Carbide” (Light Conversion), outputting either fundamental (1030 nm) or second‐harmonic (515 nm) radiation at repetition rates in the range of 60–1000 kHz and pulse duration between 250 fs and 10 ps. [ 39 ] In this work, gyroids and fullerene‐type model fabrication were carried out using 515 nm wavelength radiation, at repetition rates 200 kHz and pulse duration ≈300 fs, focused by an objective lens with 20 x 0.8 NA (Zeiss) using 1.0 mW incident irradiation power and 10 mm s −1 speed. [ 40 ] Figure S4, Supporting Information, shows the resolution test of MTMS:MAPTMS 8:2 material using different parameters (see Supporting Information).…”
Section: Methodsmentioning
confidence: 99%
“…[ 38 ] The main light source in this setup was a femtosecond laser “Carbide” (Light Conversion), outputting either fundamental (1030 nm) or second‐harmonic (515 nm) radiation at repetition rates in the range of 60–1000 kHz and pulse duration between 250 fs and 10 ps. [ 39 ] In this work, gyroids and fullerene‐type model fabrication were carried out using 515 nm wavelength radiation, at repetition rates 200 kHz and pulse duration ≈300 fs, focused by an objective lens with 20 x 0.8 NA (Zeiss) using 1.0 mW incident irradiation power and 10 mm s −1 speed. [ 40 ] Figure S4, Supporting Information, shows the resolution test of MTMS:MAPTMS 8:2 material using different parameters (see Supporting Information).…”
Section: Methodsmentioning
confidence: 99%
“…It is feasible to create tiny grating constants in hundreds of nanometers or fewer using modern X-ray photolithography (XRL) [ 108 ], electron beam lithography (EBL) [ 109 ], a focused ion beam (FIB), or nanoimprinting lithography (NIL) [ 110 ]. During the last few decades, DLW based on femtosecond (fs) pulse-induced light–matter interaction has grown significantly [ 111 , 112 ]. The ability to leverage numerous nonlinear light–matter interaction regimes as well as manage the thermal component of the process are fundamental benefits of employing fs lasers for DLW.…”
Section: Bg Structures Based On a Polymer Platformmentioning
confidence: 99%
“…The photosensitive nature of these resins, allow for micro/nano fabrication techniques as UV-lithography 17 , direct laser writing 18 , e-beam 19 , ink-jet 20 and UV-nanoimprint 21 . The dyes employed in this work cover the visible range of the spectrum, targeting future applications such as integrated lasers, biosensors, and optical communications.…”
Section: Introductionmentioning
confidence: 99%