Expanding microwave plasma process for thin molybdenum films nitriding: Nitrogen diffusion and structure investigations

Jauberteau, Isabelle; Merle-Méjean, Thérèse; Touimi, Said; Weber, Sébastien J.; Bessaudou, Annie; Passelergue, Armand; Jauberteau, Jean-Louis; Aubreton, J.

doi:10.1016/j.surfcoat.2011.03.056

Cited by 9 publications

(5 citation statements)

References 17 publications

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“…Jauberteau et al [34,[53][54][55] have prepared molybdenum nitride films from Mo films coated on Si (100) substrates in an expanding plasma reactor. The molybdenum coatings have been deposited by electron beam evaporation of a molybdenum target in pure Ar atmosphere at a pressure of 0.5 Pa on Si substrates heated at 673 K with a radiofrequency electrical discharge operating at 50 W. The deposition rates are typically equal to 0.02-0.25 nms…”

Section: β-Mo2n and γ-Mo2n Films In Expanding Plasmamentioning

confidence: 99%

Molybdenum Nitride Films: Crystal Structures, Synthesis, Mechanical, Electrical and Some Other Properties

et al. 2015

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Among transition metal nitrides, molybdenum nitrides have been much less studied even though their mechanical properties as well as their electrical and catalytic properties make them very attractive for many applications. The δ-MoN phase of hexagonal structure is a potential candidate for an ultra-incompressible and hard material and can be compared with c-BN and diamond. The predicted superconducting temperature of the metastable MoN phase of NaCl-B1-type cubic structure is the highest of all refractory carbides and nitrides. The composition of molybdenum nitride films as well as the structures and properties depend on the parameters of the process used to deposit the films. They are also strongly correlated to the electronic structure and chemical bonding. An unusual mixture of metallic, covalent and ionic bonding is found in the stoichiometric compounds.

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Section: β-Mo2n and γ-Mo2n Films In Expanding Plasmamentioning

confidence: 99%

Molybdenum Nitride Films: Crystal Structures, Synthesis, Mechanical, Electrical and Some Other Properties

et al. 2015

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“…The expanding microwave plasma process has been successfully employed to carry out nitriding treatments on thin molybdenum films from 200 nm to 1 µm thick in (Ar-N 2 -H 2 ) plasma [24][25][26]. Nitrogen diffuses in the whole thickness of films even at low temperatures (400 • C).…”

Section: Introductionmentioning

confidence: 99%

Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma

et al. 2017

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Abstract:The physical properties including the mechanical, optical and electrical properties of Ti nitrides and silicides are very attractive for many applications such as protective coatings, barriers of diffusion, interconnects and so on. The simultaneous formation of nitrides and silicides in Ti films improves their electrical properties. Ti films coated on Si wafers are heated at various temperatures and processed in expanding microwave (Ar-N 2 -H 2 ) plasma for various treatment durations. The Ti-Si interface is the centre of Si diffusion into the Ti lattice and the formation of various Ti silicides, while the Ti surface is the centre of N diffusion into the Ti film and the formation of Ti nitrides. The growth of silicides and nitrides gives rise to two competing processes which are thermodynamically and kinetically controlled. The effect of thickness on the kinetics of the formation of silicides is identified. The metastable C 49 TiSi 2 phase is the main precursor of the stable C 54 TiSi 2 phase, which crystallizes at about 600 • C, while TiN crystallizes at about 800 • C.

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“…Moreover, the decomposition of NH 3 is endothermic but it can be replaced by N 2 -H 2 gas mixtures, which circumvent the problem of heat transfer [14]. Some researchers used different approaches like an expanding microwave plasma reactor to form a Mo-N compound with defects at 600 °C or under in a gas mixture of Ar-25%N 2 -30%H 2 [7,8]. alt-text: Fig.…”

Section: The Nitriding Mechanism Of Molybdenum-based Tzm Alloymentioning

confidence: 99%

“…Jauberteau and his colleagues found that a deposited molybdenum layer could be nitrided at 600 °C in a gas mixture of argon, nitrogen and hydrogen by using an expanding microwave plasma reactor for an exposure time of 20 minutesmin [7]. They also claimed that Mo-N phases could be formed in molybdenum films even at a temperature as low as 400 °C, although the electron beam evaporation deposited molybdenum layer was very thin (400--600 nm) [8]. Their researches shed some light on plasma nitriding of molybdenum-based alloys at lower temperature, which has been widely reported to increase the surface hardness as well as the wear and corrosion resistance of hot-working tools [9].…”

Section: Introductionmentioning

confidence: 99%

Response of a molybdenum alloy to plasma nitriding

Zhang

Dong

2018

International Journal of Refractory Metals and Hard Materials

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Expanding microwave plasma process for thin molybdenum films nitriding: Nitrogen diffusion and structure investigations

Cited by 9 publications

References 17 publications

Molybdenum Nitride Films: Crystal Structures, Synthesis, Mechanical, Electrical and Some Other Properties

Molybdenum Nitride Films: Crystal Structures, Synthesis, Mechanical, Electrical and Some Other Properties

Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma

Response of a molybdenum alloy to plasma nitriding

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