Excimer laser processing of inkjet-printed and sputter-deposited transparent conducting SnO2:Sb for flexible electronics

Cranton, Wayne; Wilson, Sharron Louise; Ranson, Robert; Koutsogeorgis, Demosthenes C.; Chi, K.; Hedgley, Richard; Scott, J. C.; Lipiec, S; Spiller, A; Speakman, S.P.

doi:10.1016/j.tsf.2007.03.118

Cited by 26 publications

(8 citation statements)

References 9 publications

(9 reference statements)

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“…Polycrystalline and epitaxial growth of various MO films ( Table 2 ) has been demonstrated using laser irradiation of amorphous layers derived from CSD methods . UV lasers have been the preferred choice in these studies due to the higher optical absorbance of MOs in the UV range.…”

Section: Recent Progress and Advances In Laser Processing Of Metal Oxmentioning

confidence: 99%

Laser Irradiation of Metal Oxide Films and Nanostructures: Applications and Advances

et al. 2018

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Recent technological advances in developing a diverse range of lasers have opened new avenues in material processing. Laser processing of materials involves their exposure to rapid and localized energy, which creates conditions of electronic and thermodynamic nonequilibrium. The laser-induced heat can be localized in space and time, enabling excellent control over the manipulation of materials. Metal oxides are of significant interest for applications ranging from microelectronics to medicine. Numerous studies have investigated the synthesis, manipulation, and patterning of metal oxide films and nanostructures. Besides providing a brief overview on the principles governing the laser-material interactions, here, the ongoing efforts in laser irradiation of metal oxide films and nanostructures for a variety of applications are reviewed. Latest advances in laser-assisted processing of metal oxides are summarized.

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Section: Recent Progress and Advances In Laser Processing Of Metal Oxmentioning

confidence: 99%

Laser Irradiation of Metal Oxide Films and Nanostructures: Applications and Advances

et al. 2018

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“…Inks with nano-ITO-particles can be used to fabricate laterally structured front electrodes by printing techniques, and thus may reduce the consumption drastically (e.g., Evonik’s VP AdNano ® ITO is advertised for such purposes). Further alternatives based on Al-doped ZnO (AZO) [ 72 ], Sb-doped SnO 2 (ATO) [ 73 ] or organics are under development for the transparent electrode, but will still need some time to replace ITO. A real alternative are conductive polymers like PEDOT:PSS (commercially available from various suppliers); they are easy to apply, may be neutral in colour and meanwhile show conductivities high enough to support AC-EL at least on moderately sized panels.…”

Section: Materials For Ac-electroluminescencementioning

confidence: 99%

Materials for Powder-Based AC-Electroluminescence

Bredol

Dieckhoff

2010

Materials

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At present, thick film (powder based) alternating current electroluminescence (AC-EL) is the only technology available for the fabrication of large area, laterally structured and coloured light sources by simple printing techniques. Substrates for printing may be based on flexible polymers or glass, so the final devices can take up a huge variety of shapes. After an introduction of the underlying physics and chemistry, the review highlights the technical progress behind this development, concentrating on luminescent and dielectric materials used. Limitations of the available materials as well as room for further improvement are also discussed.

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“…An extensive body of work on LA of conductive metal oxides, mainly used as transparent electrodes, has been reported . Amongst them, the influence of laser treatment on commercially available fluorine‐doped tin oxide (FTO) has been thoroughly investigated by Li et al After reporting on the optoelectronic response of laser treated Pt/FTO and Ni/FTO thin films, their work focused on the effect of ultrasonic vibration during laser irradiation.…”

Section: Laser Annealingmentioning

confidence: 99%

Recent Progress in Photonic Processing of Metal‐Oxide Transistors

Yarali

Koutsiaki

Faber

et al. 2019

Adv Funct Materials

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(1 of 37)high mobility (µ) (even in amorphous phase), wide bandgap (transparent in the visible range), and the ability to be controllably doped. Importantly, they can be grown into thin films and various nanostructures with different scalable deposition techniques, including vacuum-based methods such as physical vapor deposition (PVD) [7,8] and chemical vapor deposition (CVD) [9] as well as solution-based processes such as spray [10] and spin coating. [11] Moreover, the resulting layers can be easily patterned using standard fabrication procedures and as such can be integrated into state-of-the-art processes for (opto)electronic applications. The above-mentioned capabilities have led to a plethora of applications such as switching backplanes for displays, transparent and flexible electronics, integrated circuits (ICs), photovoltaics (PVs), organic light-emitting diodes (OLEDs), capacitors, batteries, photocatalytic devices, electrochromics and memory devices, to name but a few. [8,[12][13][14] Because of their ability to be doped, their electronic properties can be tuned from dielectrics to semiconductors and conductors. This characteristic versatility has recently been exploited to stretch the range of their applications to new technological sectors, such as plasmonics in the near infrared and midinfrared spectral ranges. [12,15] One of the driving applications of metal oxides is in thinfilm transistors (TFTs) for large area electronics such as current driven optical displays and ICs. Following the early demonstrations, [16] most effort focused on the fabrication and processing of metal oxides TFTs paying particular attention to the device performance and applications. [1,5,6,17] Especially when processed over large areas, as in the case for display applications, the complexity to precisely control the device reliability and reproducibility becomes a challenging aspect of any TFT technology. To that respect, solution-based techniques progressed rapidly due to their lower cost and higher throughput compared to vacuum-based techniques. In both cases, the metal-oxide deposition has so far been limited to high processing temperatures (>250 °C) (Figure 1a) which renders the technology incompatible with inexpensive, temperature-sensitive substrates such as polymers, the material class of choice for various high throughput manufacturing techniques such as roll-to-roll (R2R) and sheet-to-sheet (S2S)Over the past few decades, significant progress has been made in the field of photonic processing of electronic materials using a variety of light sources. Several of these technologies have now been exploited in conjunction with emerging electronic materials as alternatives to conventional hightemperature thermal annealing, offering rapid manufacturing times and compatibility with temperature-sensitive substrate materials among other potential advantages. Herein, recent advances in photonic processing paradigms of metal-oxide thin-film transistors (TFTs) are presented with particular emphasis on the use of various light sour...

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Excimer laser processing of inkjet-printed and sputter-deposited transparent conducting SnO2:Sb for flexible electronics

Cited by 26 publications

References 9 publications

Laser Irradiation of Metal Oxide Films and Nanostructures: Applications and Advances

Laser Irradiation of Metal Oxide Films and Nanostructures: Applications and Advances

Materials for Powder-Based AC-Electroluminescence

Recent Progress in Photonic Processing of Metal‐Oxide Transistors

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