Excimer laser ablation of triazene-containing polyesters with different topologies

Abstract

We report on excimer laser polymer ablation experiments on polymers with triazene groups (Ph1N2N1NR 2 ) as well as their photolytical behavior. Two polyesters incorporating the photosensitive triazene group and their main chain (PE1a, b) are compared with one that contains this group as a pendant unit (PE2). With respect to the characteristic ablation parameters, there is no significant difference between these species but in comparison to a triazeno-polysulfide we observe increased efficiency in terms of the saturation depth d max . In contrast, the quality of the patterns depends on the topology of the triazene-containing polyester: the main-chain polyester displays ablation micropatterns of improved quality. The photolysis in solution occurs faster for the main-chain polymers built up from cyclic monomers than for open ring structures. Polymeric triazenes are photolyzed slower than the corresponding monomeric diols.

Chemical and Spectroscopic Aspects of Polymer Ablation: Special Features and Novel Directions

“…Other synthesized polymers included polymers with the triazene-group (−NN−N<) in conjunction with an ester group. Using a series of these polymers (diazo-copolyesters), the optimum triazene content of these polymers was determined to lie between 35 and 90% of the copolymer. , Another series of polymers was synthesized by replacing the ester group with a sulfide group, yielding polysulfides with triazene groups in the main chain. Under 193-nm irradiation, these polymers displayed better ablation structures than PMMA …”

Single nucleotide polymorphism in fibroblast growth factor receptor 4 at codon 388 is associated with prognosis in high‐grade soft tissue sarcoma

“…Much attention was paid to the polymers with triazene chromophores ( N  N  N <), whose structure may be conveniently adapted to the requirements for photosensitive materials such as thermostability, high photosensitivity, optical and good coating properties. So far, several triazene polymers of polyester, polyether, polysulfone, or polymethylmethacrylate type that may be structured with high resolution upon laser irradiation have been reported 1, 12–17. It would be of particular interest to explore the use of triazene derivatives in the preparation of photosensitive polyurethanes, unapproached in the literature, but recognized by their properties and broad‐spectrum applications.…”

New polyurethane cationomers with naphthyl and phenyltriazene pendants: Synthesis and properties

“…Among these, the triazene‐sensitized polymers were the subject of extensive investigations because the triazene bond through its high photosensitivity and spontaneous fragmentation into gaseous products is considered one promising candidate for excimer laser ablation lithography 3–5. Therefore, various classes of polymers containing photolabile triazene groups (Ph N  N  N ) in the main or side chain, such as polyesters, polyethers, poly(methyl methacrylates), polysulfones, or polytriazenes, with high thermal stability and favorable photolytic sensitivity, have been described in the literature 6–11. Starting from the efforts made with the above‐mentioned polymers in excimer laser ablation and the increasing demand for high‐performance new polymers, another route to tailored photopolymers should be developed.…”