Highly disperse oxides X/SiO2 (synthesized by using high-temperature hydrolysis of a SiCl4 and MCl
n
(M = Al, Ti) blend or chemical vapor deposition (CVD) technique for preparation of CVD-X (X = TiO2, GeO2)
on a fumed silica substrate) were studied by means of 1H NMR, one-pass temperature-programmed desorption
time-of-flight mass spectrometry (OPTPD-TOFMS), optical and photon correlation spectroscopies,
electrophoresis, and quantum chemical methods. The nature and the concentration of the X phase (C
X),
its distribution in (or on) the silica matrix, and pretreatment conditions have a strong influence on the
features of the X/SiO2 surfaces, e.g., type, concentration, and strength of active surface sites such as
Brønsted (B) and Lewis acid (L) sites. Also, these surface features affect the interaction of X/SiO2 with
different adsorbates and other properties, which depend nonlinearly on the C
X value and exhibit an extreme
character.