Evolution of the Internal Structure of Short-Period Cr/V Multilayers with Different Vanadium Layers Thicknesses

Qi, Runze; Huang, Qiushi; Fei, Jiani; Кожевников, И. В.; Liu, Yang; Пин, Ли; Zhang, Zhong; Wang, Zhanshan

doi:10.3390/ma12182936

Cited by 9 publications

(5 citation statements)

References 20 publications

(21 reference statements)

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“…On the contrary, the Kr-made multilayer has a polycrystalline structure with nanograins randomly distributed in the Pd layers. These nanograins have different sizes and growth orientations, which make the layer interfaces less sharp than the Ar-made multilayer [ 28 ]. This is consistent with the relatively large interface roughness of the Kr-made sample, as shown by the scattering measurements in Figure 4 .…”

Section: Resultsmentioning

confidence: 99%

Comparative Study of Pd/B4C X-ray Multilayer Mirrors Fabricated by Magnetron Sputtering with Kr and Ar Gas

Huang

Liu

et al. 2020

Materials

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Ultrathin Pd/B4C multilayers are suitable X-ray mirrors working at the photon energy region of 7–20 keV. To further improve the layer structure, Pd/B4C multilayers with a d-spacing of 2.5 nm were fabricated by magnetron sputtering using the heavy noble gas Kr and compared with the conventional ones fabricated by Ar. Although the Kr-sputtering process can work at a lower pressure, the interface width—especially the interface roughness—is a little larger than that made by Ar. A stronger polycrystallization and a lower content of sputter gas atoms were found in the Kr-made sample, which can be explained by the joint effect from less recoiled particles and lower sputtering pressure. A good reflectance of 68% of the Kr made multilayer was measured at 10 keV, which is only slightly lower than that of the Ar made sample (71%).

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Section: Resultsmentioning

confidence: 99%

Comparative Study of Pd/B4C X-ray Multilayer Mirrors Fabricated by Magnetron Sputtering with Kr and Ar Gas

Huang

Liu

et al. 2020

Materials

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“…The actual plating process parameters are shown in Table 3. Electron beam evaporation is an extremely complex process of evaporating solid material and condensing to form a thin film on the substrate surface through gas phase transport, which is affected by temperature, vacuum, evaporation rate, and oxygenation [20]. Generally speaking, the higher the substrate temperature, vacuum, and evaporation rate, the higher the kinetic energy that the evaporated film material can obtain, which can fully diffuse on the substrate surface and increase the film aggregation density and, thus, increase the refractive index [21].…”

Section: Preparation Of Thin Filmmentioning

confidence: 99%

Development of Wide-Angle Depolarizing Reflector at 1064 nm

Han

Jiang

Guo³

et al. 2023

Materials

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Optical coherence tomography is a new promising chromatographic imaging technique with the advantages of noncontact and high resolution without damage, which is widely used in the field of biological tissue detection and imaging. As an important optical element in the system, the wide-angle depolarizing reflector plays a key role in the accurate acquisition of optical signals. Ta2O5 and SiO2 are selected as the coating materials for the technical parameter requirements of the reflector in the system. Based on the basic theory of optical thin film and combined with MATLAB and OptiLayer software, the design of 0~60° incident 1064 ± 40 nm depolarizing reflective film is realized by establishing the evaluation function of the film system. To optimize the oxygen-charging distribution scheme during film deposition, the weak absorption properties of the film materials are characterized by optical thermal co-circuit interferometry. According to the sensitivity distribution of the film layer, the optical control monitoring scheme with a thickness error of less than 1% is designed rationally. “Crystal control + optical control” is used to precisely control the thickness of each film layer and complete the preparation of resonant cavity film. The measurement results show that the average reflectance is more than 99.5%, and the deviation of P-light and S-light is less than 1% in the 1064 ± 40 nm wavelength band range from 0° to 60°, which meets the requirements of optical coherence tomography system.

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“…The principle of the process of depositing thin films by a magnetron sputtering system is shown in Figure 1c. It has a simpler system and is more cost-effective compared to the ion beam sputtering, and the thin film could grow in a low-temperature environment compared to the chemical vapor deposition methods [24]. At the same time, to improve the uniformity of the thin films, the substrates maintained high-speed rotation during the deposition process.…”

Section: X-ray Diffraction (Xrd)mentioning

confidence: 99%

Crystallization and Composition of Ni-C/Ti Multilayer with Varied Ni-C Thickness

Zhang

Liu

et al. 2022

Coatings

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Ni-C/Ti are suitable for the components of neutron supermirrors with high reflectivity because of their excellent optical constant and smoother interfaces compared to Ni/Ti. In this paper, to investigate the mechanism of C doping to the interface, crystallization, and composition of a Ni-C/Ti multilayer with variable Ni-C thickness, four Ni-C/Ti multilayers were prepared by direct current magnetron sputtering, in which the thickness of the Ni-C layers was 1.5 nm, 2.5 nm, 3.5 nm, and 4.5 nm, respectively, and the thickness of the Ti layers was kept at 5 nm. The prepared samples were characterized by XRD, XPS, HRTEM, EDX, and SAED. The XRD and HRTEM results show that Ni-C layers in Ni-C/Ti multilayers translate from amorphous to polycrystal form, with their thickness increasing from 1.5 to 4.5 nm, and the crystallite size in Ni-C layers is equivalent to the layer thickness, respectively. The XPS, SAED, and EDX results illustrate that the enrichment position of C in Ni-C/Ti multilayers evolves from the Ni-C layers to the Ti layers as the respective Ni-C layer thickness increases from 2.5 to 4.5 nm. The enrichment position evolution of C in Ni-C/Ti multilayers could be due to the lower standard Gibbs free energy of TiC (−180.1 KJ/mol) compared with NiTi (−37.3 KJ/mol) and Ni3Ti (−35.9 KJ/mol) at 298K.

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Evolution of the Internal Structure of Short-Period Cr/V Multilayers with Different Vanadium Layers Thicknesses

Cited by 9 publications

References 20 publications

Comparative Study of Pd/B4C X-ray Multilayer Mirrors Fabricated by Magnetron Sputtering with Kr and Ar Gas

Comparative Study of Pd/B4C X-ray Multilayer Mirrors Fabricated by Magnetron Sputtering with Kr and Ar Gas

Development of Wide-Angle Depolarizing Reflector at 1064 nm

Crystallization and Composition of Ni-C/Ti Multilayer with Varied Ni-C Thickness

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