We found that m-plane GaN grown on m-plane sapphire nucleates in ambidirections at the initial growth stage, which seriously degrades the surface morphology and the crystallinity of m-GaN films. To avoid the ambidirectional islanding of m-plane GaN, off-cut m-plane sapphire (toward to the [112¯0] direction) substrates were introduced. When the off-angle was small as 1°–2°, the surface step determined the epitaxial orientation of m-GaN islands. Hence, an m-GaN film with a smooth surface and a low-dislocation density was obtained. However, the dislocation component of m-GaN film was increased with increasing of the off angle due to step bunches.