2021
DOI: 10.1063/5.0045518
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Evolution of atomic structure and electronic transport properties in n-type Bi2Te3 films via Bi2 planar defects

Abstract: Bi2Te3 films always exhibit n-type transport characteristics even under the Bi-rich condition, which, however, was not clarified clearly. Herein, by virtue of advanced techniques such as scanning tunneling microscopy, angle-resolved photoelectron spectroscopy, scanning transmission electron microscopy, and x-ray photoelectron spectroscopy, we are able to identify the structural evolution on the atomic scale for Bi-rich Bi2Te3 films. The excess of Bi content will lead to the formation of p-type BiTe antisite de… Show more

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Cited by 5 publications
(8 citation statements)
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“…[ 135 ] To suppress the formation of V Te and Bi Te , one needs to significantly increase the nominal Te content and promote the formation of n‐type antisites Te Bi during the deposition of Bi 2 Te 3 films. Zhang et al [ 101,105,131 ] and other researchers [ 96,136 ] have shown that a low T sub (e.g., ∼250°C) and a high Te/Bi flux ratio (e.g., Te/Bi ≈ 18/1) are effective in promoting the formation of Te Bi and improving the n e . The formation of Te Bi in Bi 2 Te 3 films by increasing the nominal Te content can be expressed by the following formula, 5xTe+(2Bi+3Te)2BiBi+(3+3x)TeTe10.15em+2xTeBi.+2xnormalefalse′.…”
Section: Strategies On Optimizing the Electronic Properties Of N‐type Bi2te3‐based Filmsmentioning
confidence: 99%
See 3 more Smart Citations
“…[ 135 ] To suppress the formation of V Te and Bi Te , one needs to significantly increase the nominal Te content and promote the formation of n‐type antisites Te Bi during the deposition of Bi 2 Te 3 films. Zhang et al [ 101,105,131 ] and other researchers [ 96,136 ] have shown that a low T sub (e.g., ∼250°C) and a high Te/Bi flux ratio (e.g., Te/Bi ≈ 18/1) are effective in promoting the formation of Te Bi and improving the n e . The formation of Te Bi in Bi 2 Te 3 films by increasing the nominal Te content can be expressed by the following formula, 5xTe+(2Bi+3Te)2BiBi+(3+3x)TeTe10.15em+2xTeBi.+2xnormalefalse′.…”
Section: Strategies On Optimizing the Electronic Properties Of N‐type Bi2te3‐based Filmsmentioning
confidence: 99%
“…The effective approach to verify the above theoretical speculation is to synthesize single-crystalline Bi 2 Te 3 films with a controlled amount of V Te , Bi Te , and Te Bi point defects, and accurately characterize their electronic band structure. The challenging task was carried out by Zhang et al [101,105,131] who achieved the precise control and direct characterization of the point defects in single-crystalline Bi 52 m e , that is, markedly smaller than in the two previous cases where V Te and Te Bi defects dominated. The in-plane band effective mass m* of Bi 2 Te 3 films was then calculated, [141] and showed m* of 2.46 m e , 2.13 m e, and 1.50 m e for films containing the dominating defects of V Te , Te Bi , and Bi Te , respectively.…”
Section: Band Engineering and The Optimization Of Carrier Effective Massmentioning
confidence: 99%
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“…Depending on the growth temperature of Bi 2 Te 3 films, the orientation of the triangle mounds varied. intercalations [113].…”
Section: Correlation Between Surface Morphology and Structural Proper...mentioning
confidence: 99%