2009
DOI: 10.1109/tns.2008.2010395
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Evidence for Lateral Angle Effect on Single-Event Latchup in 65 nm SRAMs

Abstract: Single event latchup (SEL) in a 65 nm CMOS SRAM technology due to heavy ions is observed and device sensitivity is shown to be a strong function of lateral beam orientation, angle of incidence, and temperature. Experimental results show the importance of testing at multiple lateral beam orientations to properly characterize device sensitivity.Index Terms-65 nm, azimuthal angle, grazing angle, lateral angle, radiation effects, single event latchup.

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Cited by 14 publications
(7 citation statements)
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“…Indeed, several studies in the literature have reported that impinging particles (coming from different sources of radiation) at large incident angles feature a higher probability of provoking MCUs and MBUs. Thus, it has been largely proven that heavy ions [5]- [7], low-energy protons [8]- [10] and neutrons [11]- [14] produce a strong angular dependence on SEU cross sections of modern microelectronic devices.…”
Section: Introduction and Related Workmentioning
confidence: 99%
“…Indeed, several studies in the literature have reported that impinging particles (coming from different sources of radiation) at large incident angles feature a higher probability of provoking MCUs and MBUs. Thus, it has been largely proven that heavy ions [5]- [7], low-energy protons [8]- [10] and neutrons [11]- [14] produce a strong angular dependence on SEU cross sections of modern microelectronic devices.…”
Section: Introduction and Related Workmentioning
confidence: 99%
“…3(d). The large aspect ratio of sensitive volume could cause "lateral angle effect" of SEL sensitivity, which has been verified in reference [25]. It is under further study about SV number with latchup mechanism and memory array.…”
Section: B Sel Sensitivity Maps and Determination Of Sv Numbermentioning
confidence: 76%
“…Due to the close proximity, the SEL sensitive regions of adjacent memory cells within the same well could be combined together to be a single SEL sensitive region [18], [25]. So the SV number could be related to the well columns of the SRAM.…”
Section: B Sel Sensitivity Maps and Determination Of Sv Numbermentioning
confidence: 99%
“…Furthermore, the effective LET metric is valid in this case because the angled irradiations were performed such that the ions traversed the long dimension of the SEL sensitive regions (i.e., parallel to the long N-and P-well stripes). This is also the worst-case ion trajectory for SEL [8], [9].…”
Section: Evidence Of the Effect Of Well Contact Densitiesmentioning
confidence: 99%
“…Moreover, Fig. 2 shows that the 45-nm SRAMs are more robust against SEL than the architecturally similar 65-nm SRAMs for which SEL data are given in [8]. The intrinsic process-level latchup robustness of the 45-nm technology makes latchup immunity an achievable goal through the use of hardening strategies.…”
Section: A Use Of External Resistors To Define Contact Density Requimentioning
confidence: 99%