“…Lin et al reported fabrication of ZnO film on Si(111) substrates by PLD buffered with a nanometer-thick GdO 3 (Ga 2 O 3 ), layer [11]. Wang et al was using a thin AlN buffer layer grown by MOCVD [12] and Pan et al was employing epitaxial Lu 2 O 3 buffer layer and thin ZnO nucleation layer [13]. The direct growth of ZnO or ZnMgO on Si usually results in oxidation of the Si surface and formation of amorphous silica layer.…”