2012
DOI: 10.1016/j.physleta.2012.03.034
|View full text |Cite
|
Sign up to set email alerts
|

Evidence for barrier-to-well injection of carriers in high quality ZnO/Zn0.9Mg0.1O multiple quantum wells grown on (111) Si

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2013
2013
2020
2020

Publication Types

Select...
5

Relationship

0
5

Authors

Journals

citations
Cited by 6 publications
(1 citation statement)
references
References 19 publications
0
1
0
Order By: Relevance
“…Lin et al reported fabrication of ZnO film on Si(111) substrates by PLD buffered with a nanometer-thick GdO 3 (Ga 2 O 3 ), layer [11]. Wang et al was using a thin AlN buffer layer grown by MOCVD [12] and Pan et al was employing epitaxial Lu 2 O 3 buffer layer and thin ZnO nucleation layer [13]. The direct growth of ZnO or ZnMgO on Si usually results in oxidation of the Si surface and formation of amorphous silica layer.…”
Section: Introductionmentioning
confidence: 99%
“…Lin et al reported fabrication of ZnO film on Si(111) substrates by PLD buffered with a nanometer-thick GdO 3 (Ga 2 O 3 ), layer [11]. Wang et al was using a thin AlN buffer layer grown by MOCVD [12] and Pan et al was employing epitaxial Lu 2 O 3 buffer layer and thin ZnO nucleation layer [13]. The direct growth of ZnO or ZnMgO on Si usually results in oxidation of the Si surface and formation of amorphous silica layer.…”
Section: Introductionmentioning
confidence: 99%