Evaluation results for the positive deep-UV resist AZ DX 46

Spieß, W.; Lynch, Thomas J.; Cornec, Charles Le; Escher, Gary C.; Kinoshita, Yoshiaki; Kochan, John; Kudo, Takanori; Masuda, Seiya; Mourier, Thierry; Nozaki, Yuko; Olson, Setha G.; Okazaki, Hiroshi; Padmanaban, Munirathna; Pawlowski, Georg; Przybilla, Klaus Juergen; Roeschert, Horst; Suehiro, Natusmi; Vinet, F.; Wengenroth, Horst

doi:10.1117/12.175402

Advances in Resist Technology and Processing XI 1994

DOI: 10.1117/12.175402

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Evaluation results for the positive deep-UV resist AZ DX 46

W. Spieß¹,

Thomas J. Lynch

Charles Le Cornec

et al.

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Evaluation results for the positive deep-UV resist AZ DX 46

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