Evaluation of Volatility and Thermal Stability in Monomeric and Dimeric Lanthanide(III) Complexes Containing Enaminolate Ligands

Jayakodiarachchi, Navoda; Evans, Paul G.; Ward, Catherine; Winter, Charles H.

doi:10.1021/acs.organomet.1c00076

Cited by 2 publications

(10 citation statements)

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“…The synthesis, characterization, volatility, and thermal stability of 1 were described in our recent report. 53 Precursor 1 has a melting point of 93-95 °C, a distillation temperature of ∼110 °C at 0.5 Torr, and a decomposition temperature of ∼265 °C. Since 1 has a melting point below its delivery temperature in the ALD reactor, vapor transport occurs from the liquid state.…”

Section: Resultsmentioning

confidence: 99%

“…Complex 1 adopts a monomeric, 6-coordinate distorted octahedral geometry, with structural features very similar to those of the Lu analog. 53 The structural data of 1 are presented in the ESI (Tables S1-S3 and Fig. S1 †).…”

Section: Resultsmentioning

confidence: 99%

“…Erbium precursor 1 was synthesized following the previously reported procedure and was sublimed prior to use. 53 Precursor 1 was delivered using a Picosolid booster at 125 °C and water was delivered using a conventional vapor draw bubbler at 23 °C.…”

Section: Methodsmentioning

confidence: 99%

“…Dalton Transactions decomposition before the precursor reaches the substrate surface, as evidenced by decomposition of precursor 1 at 265 °C, 53 or because of dehydration of surface Er-OH groups above 250 °C, resulting in fewer surface reactive sites.…”

Section: Papermentioning

confidence: 99%

“…We recently reported the syntheses, structural characteristics, volatilities, and thermal stabilities of lanthanide( iii ) complexes containing enaminolate ligands that are derived from deprotonation of α-amino ketones. 53 Herein, we report the optimization of the ALD growth of Er 2 O 3 films using the enaminolate precursor, tris(1-(dimethylamino)-3,3-dimethylbut-1-en-2-olate)erbium( iii ) ( 1 , Fig. 1), with water as the co-reactant.…”

Section: Introductionmentioning

confidence: 99%

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Thermal atomic layer deposition of Er₂O₃ films from a volatile, thermally stable enaminolate precursor

Jayakodiarachchi,

Liu,

Dharmadasa

et al. 2023

Dalton Trans.

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Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

Section: Papermentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Thermal atomic layer deposition of Er₂O₃ films from a volatile, thermally stable enaminolate precursor

Jayakodiarachchi,

Liu,

Dharmadasa

et al. 2023

Dalton Trans.

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The surface chemistry of the atomic layer deposition of metal thin films

Zaera

2024

Nanotechnology

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In this perspective we discuss the progress made in the mechanistic studies of the surface chemistry associated with the atomic layer deposition (ALD) of metal films and the usefulness of that knowledge for the optimization of existing film growth processes and for the design of new ones. Our focus is on the deposition of late transition metals. We start by introducing some of the main surface-sensitive techniques and approaches used in this research. We comment on the general nature of the metallorganic complexes used as precursors for these depositions, and the uniqueness that solid surfaces and the absence of liquid solvents bring to the ALD chemistry and differentiate it from what is known from metalorganic chemistry in solution. We then delve into the adsorption and thermal chemistry of those precursors, highlighting the complex and stepwise nature of the decomposition of the organic ligands that usually ensued upon their thermal activation. We discuss the criteria relevant for the selection of co-reactants to be used on the second half of the ALD cycle, with emphasis on the redox chemistry often associated with the growth of metallic films starting from complexes with metal cations. Additional considerations include the nature of the substrate and the final structural and chemical properties of the growing films, which we indicate rarely retain the homogeneous 2D structure often aimed for. We end with some general conclusions and personal thoughts about the future of this field.

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Evaluation of Volatility and Thermal Stability in Monomeric and Dimeric Lanthanide(III) Complexes Containing Enaminolate Ligands

Cited by 2 publications

References 76 publications

Thermal atomic layer deposition of Er₂O₃ films from a volatile, thermally stable enaminolate precursor

Thermal atomic layer deposition of Er₂O₃ films from a volatile, thermally stable enaminolate precursor

The surface chemistry of the atomic layer deposition of metal thin films

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Evaluation of Volatility and Thermal Stability in Monomeric and Dimeric Lanthanide(III) Complexes Containing Enaminolate Ligands

Cited by 2 publications

References 76 publications

Thermal atomic layer deposition of Er2O3 films from a volatile, thermally stable enaminolate precursor

Thermal atomic layer deposition of Er2O3 films from a volatile, thermally stable enaminolate precursor

The surface chemistry of the atomic layer deposition of metal thin films

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Thermal atomic layer deposition of Er₂O₃ films from a volatile, thermally stable enaminolate precursor

Thermal atomic layer deposition of Er₂O₃ films from a volatile, thermally stable enaminolate precursor