“…[ 67 ] On the other hand, the shift to smaller wavenumbers can be explained by neighboring group effects due to the bound methyl groups. [ 70 ]…”
Section: Resultsmentioning
confidence: 99%
“…[67] On the other hand, the shift to smaller wavenumbers can be explained by neighboring group effects due to the bound methyl groups. [70] Besides the shift of the main peak, Figure 3 shows strong differences in peaks representing methyl groups. Whereas the SiOCH spectrum shows clear peaks at the wavenumbers 1263, 890, 850, and 800 cm −1 , the SiOx spectrum shows only a minor peak at about 800 cm −1 .…”
Section: Chemical Analysis Of Pecvd Coatingsmentioning
This study tracks the physical aging behavior of coated and uncoated ultra-thin poly(1-trimethylsilyl-1-propyne) (PTMSP) films on silicon wafers based on the refractive index using ellipsometry. The measured refractive index directly correlates with the free volume and hence the physical aging progression. Plasma-enhanced chemical vapor deposition (PECVD) creates coatings with different thicknesses and oxidation degrees onto PTMSP films. Compared to uncoated PTMSP films, the PECVD-coated films show a reduction of the refractive index increase of more than two orders of magnitude for less than 10 nm thin SiOx coatings. In contrast, SiOCH films show only a minor impact. The results reveal the superior physical aging behavior of PECVD-coated films compared to untreated PTMSP films.
“…[ 67 ] On the other hand, the shift to smaller wavenumbers can be explained by neighboring group effects due to the bound methyl groups. [ 70 ]…”
Section: Resultsmentioning
confidence: 99%
“…[67] On the other hand, the shift to smaller wavenumbers can be explained by neighboring group effects due to the bound methyl groups. [70] Besides the shift of the main peak, Figure 3 shows strong differences in peaks representing methyl groups. Whereas the SiOCH spectrum shows clear peaks at the wavenumbers 1263, 890, 850, and 800 cm −1 , the SiOx spectrum shows only a minor peak at about 800 cm −1 .…”
Section: Chemical Analysis Of Pecvd Coatingsmentioning
This study tracks the physical aging behavior of coated and uncoated ultra-thin poly(1-trimethylsilyl-1-propyne) (PTMSP) films on silicon wafers based on the refractive index using ellipsometry. The measured refractive index directly correlates with the free volume and hence the physical aging progression. Plasma-enhanced chemical vapor deposition (PECVD) creates coatings with different thicknesses and oxidation degrees onto PTMSP films. Compared to uncoated PTMSP films, the PECVD-coated films show a reduction of the refractive index increase of more than two orders of magnitude for less than 10 nm thin SiOx coatings. In contrast, SiOCH films show only a minor impact. The results reveal the superior physical aging behavior of PECVD-coated films compared to untreated PTMSP films.
“…It allows the fabrication of tailored coatings with regard to mechanical and chemical properties and, at the same time, enables low coating thicknesses in the nanometer range. The formation of organosilica layers by PECVD utilizing hexamethyldisiloxane (HMDSO) as a precursor results in membranes with gas separation characteristics [ 15 , 16 , 17 , 18 , 19 , 20 , 21 , 22 , 23 ]. Inorganic [ 24 , 25 , 26 , 27 ] or organic substrate membranes [ 15 , 21 , 22 , 23 , 28 , 29 , 30 , 31 , 32 , 33 ] function as support for the thin organosilica layer.…”
Section: Introductionmentioning
confidence: 99%
“…The formation of organosilica layers by PECVD utilizing hexamethyldisiloxane (HMDSO) as a precursor results in membranes with gas separation characteristics [ 15 , 16 , 17 , 18 , 19 , 20 , 21 , 22 , 23 ]. Inorganic [ 24 , 25 , 26 , 27 ] or organic substrate membranes [ 15 , 21 , 22 , 23 , 28 , 29 , 30 , 31 , 32 , 33 ] function as support for the thin organosilica layer. Besides, PECVD enables the combination of advantages of different membrane materials.…”
Section: Introductionmentioning
confidence: 99%
“…Furthermore, PECVD is already industrially used and scalable in roll-to-roll processes and therefore can be easily applied for industrial scale membrane production [ 34 ]. Since the resulting selective layer properties are dependent on the plasma parameters [ 22 , 23 ], membranes for different separation tasks can be fabricated on the same production line by only changing the plasma parameters. While PECVD membranes are not a new concept in the literature of the last two decades, research does not offer much information on mixed gas experiments with such membranes.…”
Selective, nanometer-thin organosilica layers created by plasma-enhanced chemical vapor deposition (PECVD) exhibit selective gas permeation behavior. Despite their promising pure gas performance, published data with regard to mixed gas behavior are still severely lacking. This study endeavors to close this gap by investigating the pure and mixed gas behavior depending on temperatures from 0 °C to 60 °C for four gases (helium, methane, carbon dioxide, and nitrogen) and water vapor. For the two permanent gases, helium and methane, the studied organosilica membrane shows a substantial increase in selectivity from αHe/CH4 = 9 at 0 °C to αHe/CH4 = 40 at 60 °C for pure as well as mixed gases with helium permeance of up to 300 GPU. In contrast, a condensable gas such as CO2 leads to a decrease in selectivity and an increase in permeance compared to its pure gas performance. When water vapor is present in the feed gas, the organosilica membrane shows even stronger deviations from pure gas behavior with a permeance loss of about 60 % accompanied by an increase in ideal selectivity αHe/CO2 from 8 to 13. All in all, the studied organosilica membrane shows very promising results for mixed gases. Especially for elevated temperatures, there is a high potential for separation by size exclusion.
This feature article presents insights concerning the correlation of plasma‐enhanced chemical vapor deposition and plasma‐enhanced atomic layer deposition thin film structures with their barrier or membrane properties. While in principle similar precursor gases and processes can be applied, the adjustment of deposition parameters for different polymer substrates can lead to either an effective diffusion barrier or selective permeabilities. In both cases, the understanding of the film growth and the analysis of the pore size distribution and the pore surface chemistry is of utmost importance for the understanding of the related transport properties of small molecules. In this regard, the article presents both concepts of thin film engineering and analytical as well as theoretical approaches leading to a comprehensive description of the state of the art in this field. Perspectives of future relevant research in this area, exploiting the presented correlation of film structure and molecular transport properties, are presented.
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