Evaluation of the dynamic range and spatial resolution of nonadiabatic optical near-field lithography through fabrication of Fresnel zone plates

Kawazoe, Tadashi; Takahashi, T.; Ohtsu, Motoichi

doi:10.1007/s00340-009-3680-z

Cited by 17 publications

(7 citation statements)

References 19 publications

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“…Near-field optical lithography techniques have received much attention as new tools for realizing nanoprocessing briefly. − Among these techniques, surface plasmons (SPs) − have become increasingly utilized for optical lithography with subwavelength resolution. − Typically, the optical field of propagating or localized SP modes formed on externally illuminated metallic gratings, apertures, sharp tips, , or other nanoscale features is used for contact exposure of the photosensitive medium. The resolution of SP lithography generally depends on (and is limited by) the size of metallic features and the interference of SP modes − rather than the illumination wavelength.…”

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confidence: 99%

“…SECTION Nanoparticles and Nanostructures N ear-field optical lithography techniques have received much attention as new tools for realizing nanoprocessing briefly. [1][2][3] Among these techniques, surface plasmons (SPs) [4][5][6] have become increasingly utilized for optical lithography with subwavelength resolution. [7][8][9][10][11][12][13] Typically, the optical field of propagating or localized SP modes formed on externally illuminated metallic gratings, apertures, sharp tips, 14,15 or other nanoscale features is used for contact exposure of the photosensitive medium.…”

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confidence: 99%

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Nanogap-Assisted Surface Plasmon Nanolithography

Ueno

Takabatake

Nishijima

et al. 2010

J. Phys. Chem. Lett.

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confidence: 99%

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confidence: 99%

Nanogap-Assisted Surface Plasmon Nanolithography

Ueno

Takabatake

Nishijima

et al. 2010

J. Phys. Chem. Lett.

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“…A fully automatic practical photolithography machine has been developed and was used to form a diffraction grating pattern with a half-pitch as narrow as 22 nm 57 . It also produced a two-dimensional array of the DP devices 58 , and practical devices for soft X-rays (a Fresnel zone plate 59 and a diffraction grating 60 ).…”

Section: Nano-fabrication Technologymentioning

confidence: 99%

<p style="text-align: left;">History, current developments, and future directions of near-field optical science

Ohtsu¹

2020

OEA

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This paper reviews the science of the optical near-field (ONF), which is created and localized in a nanometer-sized material (NM) or on its surface. It is pointed out that work on near-field optics was started in order to break through the diffraction limit in optical microscopy and had already come to an end without giving answers to the essential questions on the origin of the near-field optical interaction. However, recent studies have reincarnated these studies and identified the ONF as an off-shell quantum field. Based on this identification, a novel science called off-shell science has started on the basis that the dispersion relation between energy and momentum is invalid for the ONF. This quantum field is called the dressed photon because it is created as a result of the interaction between photons and electrons (or excitons) in a NM and, thus, it accompanies the energies of electrons or excitons. In reviewing current developments, this paper presents fifteen novel phenomena that are contrary to the common views in conventional optical science. Novel technologies developed by applying these phenomena are also reviewed. These include: nanometer-sized optical devices, nano-fabrication technology, and energy conversion technology. High-power Si light emitting diodes, Si lasers, and SiC polarization rotators are reviewed as examples of electrical to optical energy conversion. For future directions, this paper also reviews novel theoretical studies that have commenced recently by relying on physical and mathematical bases.

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“…The energy of the DPP is larger than that of the DP and the incident free photon, contributed from the electron and phonon. The use of DPPs has facilitated novel nanoscale technology [13,14].…”

Section: Dressed-photon-assisted Near-field Processmentioning

confidence: 99%

Room-temperature growth of high-quality ZnO nanocrystals using a dressed-photon-assisted near-field process

et al. 2012

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Single-crystalline ZnO nanocrystals were fabricated by room-temperature photo-chemical vapor deposition (PCVD). We further enhanced the growth of highquality single-crystalline ZnO nanocrystals using dressed photons and phonons (DPPs). This resulted in greater position control and the growth of high-quality ZnO nanocrystals. The ZnO nanocrystals produced with DPPs had excellent cathodoluminescence characteristics, indicating that the near-field PCVD process could be a promising technique for nanophotonic integrated circuit production.

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Evaluation of the dynamic range and spatial resolution of nonadiabatic optical near-field lithography through fabrication of Fresnel zone plates

Cited by 17 publications

References 19 publications

Nanogap-Assisted Surface Plasmon Nanolithography

Nanogap-Assisted Surface Plasmon Nanolithography

<p style="text-align: left;">History, current developments, and future directions of near-field optical science

Room-temperature growth of high-quality ZnO nanocrystals using a dressed-photon-assisted near-field process

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