Evaluation of Supercapacitor Properties of Radio Frequency Sputter Binder‐Free and Nanosandwich WO₃/SiO₂/WO₃ Thin Film

Abstract

Supercapacitors require efficient and environmentally friendly electrodes. This study investigates the promising potential of a tungsten oxide/silicon dioxide/tungsten oxide (WO3/SiO2/WO3) thin film on a Cu substrate as an alternative to conventional metal oxide flexible electrodes. Motivated by the need for enhanced energy storage capabilities, the WO3/SiO2/WO3 composite combines WO3 high specific capacitance and electrochemical stability of WO3 with improved mechanical durability and high surface area of SiO2, offering a synergistic solution to overcome electrode limitations. Utilizing the Radio Frequency (Rf) Magnetron Sputtering technique, the WO3/SiO2/WO3 thin film is precisely deposited on a Cu flexible substrate without organic additives, conductive agents, binder chemicals, or substrate pre‐treatment. Electrochemical characterization reveals the film’s pseudocapacitive behaviour, facilitated by the SiO2 interlayer, enabling influential adjustment of electrolyte ions within the electrode structure. The obtained high specific capacitances at various scan rates and current densities demonstrate the potential of the thin film for supercapacitor applications. This research highlights the nanosandwich WO3/SiO2/WO3 thin film as a promising material for flexible energy storage and intelligent nanodevices, making it a noteworthy candidate for various flexible applications. The findings contribute to the development of efficient and environmentally friendly energy storage solutions.This article is protected by copyright. All rights reserved.