Evaluation of nanoimprint lithography as a fabrication method of distributed feedback laser diodes

Yanagisawa, Masaki; Tsuji, Yasuhidé; Yoshinaga, Hiroyuki; Hiratsuka, Kenji; Taniguchi, Jun

doi:10.1088/1742-6596/191/1/012007

Cited by 4 publications

(3 citation statements)

References 6 publications

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“…a) shows the scanning electron microscope (SEM) picture of gratings after soft imprint with residual resist, (b) shows the mask after residual resist etching, (c) shows the cross profile of the grating after etching with phase shift, and (d) shows the surface of the grating after etching. Comparing with holographic exposures as can be seen in figure5(a), the grating quality improved a lot as can be seen in figure5(b) which will also help to improve the device stability and uniformity[14]. Figures4 (e) and ( f ) show the picture of the device.…”

mentioning

confidence: 83%

Experimental demonstration of a 16-channel DFB laser array based on nanoimprint technology

Zhao

Chen

Zhou³

et al. 2013

Semicond. Sci. Technol.

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A 16-channel monolithically integrated index-coupled distributed-feedback laser array has been fabricated using nanoimprint technology. Selective lasing wavelengths with 300 and 100 GHz frequency space are obtained. The fine tenability for an individual laser in the array is achieved with a Ti-Au thin-film resistor integrated on the chip. The typical threshold current is between 10 and 15 mA without current in the thin-film resistor. The optical output power of each channel is about 6 mW at an injection current of 70 mA.

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confidence: 83%

Experimental demonstration of a 16-channel DFB laser array based on nanoimprint technology

Zhao

Chen

Zhou³

et al. 2013

Semicond. Sci. Technol.

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“…We have studied nanoimprint lithography (NIL) for fabricating diffraction gratings of DFB-LDs. [14][15][16][17][18] We have already demonstrated the fabrication of highly uniform gratings, good laser characteristics, and over 5000-h reliability. NIL is a promising method for fabricating micro/nanodevices at low cost because of its simple mechanism.…”

Section: Introductionmentioning

confidence: 99%

Single-stripe tunable laser with chirped sampled gratings fabricated by nanoimprint lithography

Yoshinaga

Yanagisawa

Kaneko

et al. 2014

Jpn. J. Appl. Phys.

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The fabrication of diffraction gratings of a chirped sampled gratings distributed reflector (CSG-DR) laser by nanoimprint lithography (NIL) has been demonstrated. The diffraction gratings with highly uniform linewidth and period have been successfully fabricated by the combination of the reverse-tone NIL and precise etching techniques. The CSG-DR laser fabricated by NIL shows a sufficiently wide tuning range of 40 nm as we designed. The results of this study indicate that our fabrication process for the sampled gratings utilizing the NIL technique has a high potential for the fabrication of a CSG-DR laser.

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“…19) A novel method of NIL using a UV-curable polymer was introduced by Haisma et al 20) We have employed the nanoimprint technique to form diffraction gratings of distributed feedback laser diodes (DFB LDs) with a wavelength of 1300 or 1500 nm for optical communication. [21][22][23] The linewidth of diffraction gratings is a critical factor of DFB LDs, because it significantly affects the coupling coefficient. Compound semiconductor substrates, such as InP, used for the fabrication of DFB LDs have a certain undulation, which deteriorates the uniformity of the linewidth of the imprinted resin.…”

Section: Introductionmentioning

confidence: 99%

Highly Uniform Fabrication of Diffraction Gratings for Distributed Feedback Laser Diodes by Nanoimprint Lithography

Tsuji¹,

Yanagisawa²,

Yoshinaga³

et al. 2011

Jpn. J. Appl. Phys.

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We have used a nanoimprint technique to fabricate diffraction gratings of distributed feedback laser diodes (DFB LDs) used in optical communication. We have aimed to establish the fabrication process featuring the high reproducibility of the period and linewidth of grating corrugations, which leads to an increase in the production yield of DFB LDs. The combination of the reverse tone nanoimprint and optimized etching techniques has contributed to the improvement of the reproducibility. The variation in grating period has been less than 0.2 nm and the variation in linewidth has been less than 10 nm over the six wafers. The results of this study indicate that our fabrication process for the diffraction gratings utilizing the nanoimprint technique has a high potential for the fabrication of DFB LDs.

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Evaluation of nanoimprint lithography as a fabrication method of distributed feedback laser diodes

Abstract: Evaluation of nanoimprint lithography as a fabrication method of distributed feedback laser diodes

Cited by 4 publications

References 6 publications

Experimental demonstration of a 16-channel DFB laser array based on nanoimprint technology

Experimental demonstration of a 16-channel DFB laser array based on nanoimprint technology

Single-stripe tunable laser with chirped sampled gratings fabricated by nanoimprint lithography

Highly Uniform Fabrication of Diffraction Gratings for Distributed Feedback Laser Diodes by Nanoimprint Lithography

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