Evaluation of microlithographic performance of ‘deep UV’ resists: Synthesis, and 2D NMR studies on alternating ‘high ortho’ novolak resins

Sharma, Maneesh; Naik, Akshay; Raghunathan, P.; Eswaran, S. V.

doi:10.1007/s12039-011-0159-3

Cited by 9 publications

(6 citation statements)

References 21 publications

(32 reference statements)

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“…In the traditional transfer and patterning processes, the main organic polymers that come into contact with graphene are PMMA and the photoresist (AZ 5214). The primary macromolecular component of the photoresist is a novolak resin [24,25]. We employed the In the traditional transfer and patterning processes, the main organic polymers that come into contact with graphene are PMMA and the photoresist (AZ 5214).…”

Section: Surface Analysismentioning

confidence: 99%

Enhancing the Consistency and Performance of Graphene-Based Devices via Al Intermediate-Layer-Assisted Transfer and Patterning

Wang,

Su,

Wei

et al. 2024

Nanomaterials

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Graphene has garnered widespread attention, and its use is being explored for various electronic devices due to its exceptional material properties. However, the use of polymers (PMMA, photoresists, etc.) during graphene transfer and patterning processes inevitably leaves residues on graphene surface, which can decrease the performance and yield of graphene-based devices. This paper proposes a new transfer and patterning process that utilizes an Al intermediate layer to separate graphene from polymers. Through DFT calculations, the binding energy of graphene–Al was found to be only −0.48 eV, much lower than that of PMMA and photoresist with graphene, making it easier to remove Al from graphene. Subsequently, this was confirmed through XPS analysis. A morphological characterization demonstrated that the graphene patterns prepared using the Al intermediate layer process exhibited higher surface quality, with significantly reduced roughness. It is noteworthy that the devices obtained with the proposed method exhibited a notable enhancement in both consistency and sensitivity during electrical testing (increase of 67.14% in temperature sensitivity). The low-cost and pollution-free graphene-processing method proposed in this study will facilitate the further commercialization of graphene-based devices.

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Section: Surface Analysismentioning

confidence: 99%

Enhancing the Consistency and Performance of Graphene-Based Devices via Al Intermediate-Layer-Assisted Transfer and Patterning

Wang,

Su,

Wei

et al. 2024

Nanomaterials

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“…Işık etkisiyle çapraz bağlanan polimer yapıda film ve kaplamalar negatif rezistlerdir. Işık etkisiyle parçalanan film ve kaplamaların ise pozitif rezist oldukları söylenebilir [3]. Fotorezistlerin mekanizması Şekil 1'de verilmiştir [4].…”

Section: Introductionunclassified

Evaluation of photolitographic properties of functional groups containing polystyrenes

CERİT¹

2022

Pamukkale J Eng Sci

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“…Fahrenholtz et al, Wu et al, and Kuo et al verified that the compatibility and glass transition temperatures ( T g values) of some novolac blends, such as with poly(methyl methacrylate) or poly(vinylpyridines), were significantly improved, because of the formation of hydrogen bonds network in the novolac blends. For this reason, novolac resins could be used not only as intermediate products of cured PR but also as a polar resin with good compatibility with other resins. , The hydrogen bonds in novolac blends can easily be characterized by FTIR and NMR. ,,, However, the number and distribution of hydrogen bonds in novolac resins are difficult to be investigated using the above techniques, and it has also proved challenging to evaluate the influence of hydrogen bonds on the chain conformation and physical properties of novolac resins.…”

Section: Introductionmentioning

confidence: 99%

Role of Nonbond Interactions in the Glass Transition of Novolac-Type Phenolic Resin: A Molecular Dynamics Study

Bian¹,

Wang²,

Liu³

et al. 2016

Ind. Eng. Chem. Res.

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Nonbond interactions, such as hydrogen bonds and π–π/p-π interactions, have a decisive effect on the physical properties of phenolic-rich polymers, such as the novolac-type phenolic resins. To study the influence of nonbond interactions on the glass transition temperature (T g) of novolac resins, both the molecular dynamics and experimental approaches were applied. The results show that, compared with the o-p′ type novolac, the o-o′ type novolac models have relatively lower gyration radiuses and higher T g values because more intramolecular hydrogen bonds can be formed in the o-o′ type novolac models. As there are fewer hydrogen bonds formed in o-p′ type novolac, the π–π and p-π interactions, which decrease with the degree of polymerization and temperature, strongly influence the glass transition of o-p′ type novolac. These results provide a new perspective on the structural-property relationship of phenolic resin.

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Evaluation of microlithographic performance of ‘deep UV’ resists: Synthesis, and 2D NMR studies on alternating ‘high ortho’ novolak resins

Abstract: Lithographic evaluation of a 'deep UV' negative photoresist is discussed along with the synthesis of an alternating 'high-ortho' novolak resin. 2-D NMR studies (COSY, NOESY, HSQC, HMBC) on this resin are also discussed.

Cited by 9 publications

References 21 publications

Enhancing the Consistency and Performance of Graphene-Based Devices via Al Intermediate-Layer-Assisted Transfer and Patterning

Enhancing the Consistency and Performance of Graphene-Based Devices via Al Intermediate-Layer-Assisted Transfer and Patterning

Evaluation of photolitographic properties of functional groups containing polystyrenes

Role of Nonbond Interactions in the Glass Transition of Novolac-Type Phenolic Resin: A Molecular Dynamics Study

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