2005
DOI: 10.1109/tuffc.2005.1504001
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Evaluation of glass materials by using the line-focus-beam ultrasonic-material-characterization system

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Cited by 11 publications
(8 citation statements)
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“…We proposed an evaluation method of glass materials using ultrasonic microspectroscopy (UMS) technology [1][2][3]. UMS technology was previously applied to characterization of silica glasses, and it was found that acoustic properties, viz.…”
Section: Introductionmentioning
confidence: 99%
“…We proposed an evaluation method of glass materials using ultrasonic microspectroscopy (UMS) technology [1][2][3]. UMS technology was previously applied to characterization of silica glasses, and it was found that acoustic properties, viz.…”
Section: Introductionmentioning
confidence: 99%
“…5) However, it has often been seen that the measurement precision of LSAW velocities decreases for certain glass materials including silicate glasses. [13][14][15] This experience is considered, in the measurement principle, to be closely related to waveform attenuation of the VðzÞ curves. 1,16,17) Such deterioration in measurement precision is a serious problem in the evaluation of ultra-low expansion glasses such as TiO 2 -SiO 2 glass and Li 2 O-Al 2 O 3 -SiO 2 glass ceramic.…”
Section: Introductionmentioning
confidence: 99%
“…2) This system has also been applied successfully to property analysis and evaluation of glass materials, including homogeneity evaluation of silicate glass substrates for SAW devices, 3,4) investigation of relationships between acoustic properties and impurity concentrations in acoustic fibers, 5) evaluation of optical fiber preform, 6) evaluation of silica (SiO 2 ) glasses and their production process, 7,8) and study of highly accurate evaluation methods for glass materials. 9) Most recently, system development of extreme ultraviolet lithography (EUVL), a future key technology for mass producing Super-LSI circuits with a line width of less than 45 nm, has been conducted in the semiconductor nanoelectronics. The most important issue to realize the EUVL system is to develop ultra-low-expansion glasses as the basic substrate material suitable for reflective optics and photomask blanks, having a coefficient of thermal expansion (CTE) within AE5 ppb/K at the desired operating temperature (for example, 22 AE 3 C for EUVL mask blanks).…”
Section: Introductionmentioning
confidence: 99%