Evaluation of area scaling of the reactive ion-plasma etched astronomical diffraction gratings
Hanshin Lee,
Uma K. Subash,
Menelaos K. Poutous
Abstract:Over the past two years, we have been developing the Reactive Ion-PLasma Etched (RIPLE) grating technology. Early on, we demonstrated the process to be a highly predictive, based on experimental verification of the near theoretical super-broadband diffraction efficiency from a proof-of-concept 1x1 sq. inch RIPLE grating. All measured 0 th and 1 st order diffraction efficiency scans from this prototype matched numerical model predictions within 2% at 1σ-level, indicating a highly stable process and non-signific… Show more
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