2012
DOI: 10.1016/j.microrel.2012.06.093
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Evaluation by three-point-bend and ball-on-ring tests of thinning process on silicon die strength

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Cited by 16 publications
(13 citation statements)
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“…Also, this SBS range with such die thicknesses was within the variations that were estimated from [9-11, 19, 35, 36]. The differences could be due to the discrepancy of the sample preparation, different silicon type and with the combination of 4PB and those ball ring tests setup [12,[15][16][17][20][21][22][23]. However, a slight improvement at a lower thickness value was observed; this may be attributed to the extra removal of silicon defects and damage layers during the thinning and surface treatment processes.…”
Section: Influence Of Silicon Thicknesses On Sbssupporting
confidence: 57%
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“…Also, this SBS range with such die thicknesses was within the variations that were estimated from [9-11, 19, 35, 36]. The differences could be due to the discrepancy of the sample preparation, different silicon type and with the combination of 4PB and those ball ring tests setup [12,[15][16][17][20][21][22][23]. However, a slight improvement at a lower thickness value was observed; this may be attributed to the extra removal of silicon defects and damage layers during the thinning and surface treatment processes.…”
Section: Influence Of Silicon Thicknesses On Sbssupporting
confidence: 57%
“…Those bending stresses are mostly developed through a defined system curvature with a wafer bowing effect. Higher strength is expected with extra treatment on the silicon surface without major influence of edge defects or chipoff [12,[15][16][17][20][21][22][23].…”
Section: Influence Of Silicon Thicknesses On Sbsmentioning
confidence: 99%
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