2012
DOI: 10.1007/s00339-012-6914-6
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EUV reflectometry for thickness and density determination of thin film coatings

Abstract: An EUV reflectometer for the analysis of surfaces and thin films regarding refractive index, surface roughness, and mass density at the wavelength of 12.98 nm was developed. The setup uses a laser produced plasma source with an oxygen gas puff target for the generation of narrow-band EUV radiation and a flexible Kirkpatrick-Baez optics for focusing. We present EUV reflectometry (EUVR) measurements conducted on a series of carbon thin films to determine thickness and mass density of the coatings. In case of the… Show more

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Cited by 16 publications
(7 citation statements)
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References 15 publications
(18 reference statements)
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“…In terms of the raw reflectance, the measurements presented in this paper can be compared with the measurements at the wavelength of 12.98 nm conducted in Laser-Laboratorium Göttingen e.V 11 . using a laser-produced plasma from a gas puff target.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…In terms of the raw reflectance, the measurements presented in this paper can be compared with the measurements at the wavelength of 12.98 nm conducted in Laser-Laboratorium Göttingen e.V 11 . using a laser-produced plasma from a gas puff target.…”
Section: Resultsmentioning
confidence: 99%
“…In the literature available to date and in the materials provided by the manufacturer, one can find a relatively complete set of scatterometer measurements of the Acktar Magic Black™ coating for selected wavelengths in the visible range (VIS) 6 , 7 . However, for the UV range, there are available only measurements of the BRDF for 193 nm in the specular plane and of the reflectance for a limited set of the incidence and scattering angles for 13 nm 11 . Lyman-α diffuse-reflectance characteristics of 10 different materials were discussed in Ref.…”
Section: Introductionmentioning
confidence: 99%
“…Optical reflectometry is a method which analyzes the reflectance spectra of a sample to measure characteristics such as optical constants and thin film thickness and is a well-known and powerful technique for measuring film thickness quickly in several industries [ 12 , 74 , 75 , 76 , 77 ]. There are extensive variants of this method, which are widely available for review in the literature, but the key operating principle of this methodology is the illumination of a sample with an optical light source, detection of the reflected intensity and fitting this intensity as a function of coating thickness [ 76 ].…”
Section: Potential In-line Coating Thickness Test Methodsmentioning
confidence: 99%
“…It can penetrate materials that are opaque to visible light, making it possible to image buried structures and to extract depth-dependent composition (13). When incident at angles between grazing and ~45°, EUV light has a sufficiently high reflectivity to image most samples (14)(15)(16)(17)(18)(19). Combined with the fact that the penetration depth of EUV light is sufficiently long to probe interesting structures in most materials, this makes EUV light well suited for general reflectometry applications.…”
Section: Introductionmentioning
confidence: 99%