EUV Interferometric Lithography

Abstract

Interferometric lithography is a well-known methodology to fabricate the periodic nano-scale structures such as nano-wires and nano-dots. It has also been widely studied by using extreme-ultraviolet light source because this approach might be able to characterize the light source, optics, and photo-resist to be used for the next generation projection lithography. Typically, the incident beam into the periodic grating diffracts and interferes at the downstream imaging position. These interference fringes, i.e. sinusoidal profiles, can be patterned on the photo-resist.In this paper, the basic concept of interferometric lithography is described. In addition, the Lloyd's mirror inter-