EUV imaging with a 13nm tabletop laser reaches sub-38nm spatial resolution

Abstract

We have acquired images with sub-38 nm spatial resolution using a tabletop extreme ultraviolet (EUV) imaging system operating at a wavelength of 13.2 nm, which is within the bandwidth of Mo/Si lithography mirrors This zone platebased, full-field microscope has the power to render images in only several seconds with up to a 10,000 µm 2 field of view. The ability to acquire such high-resolution images using a compact EUV plasma laser source opens many possibilities for nanotechnology, including in-house actinic inspection of EUV lithography mask blanks.