EUV diagnostics of pulsed plasma systems

Abstract

Extreme ultraviolet (EUV) diagnostics have been a subject of continuing interest for last several decades in the field of space and plasma sciences. In recent days, EUV diagnostics are being widely employed in the laboratories and industries to characterize EUV emission from the EM radiation sources that have strong impacts on future technology. This paper gives description of some of the important EUV diagnostics such as EUV photon detector, EUV energy measurement system, EUV pinhole camera, grazing incidence spectrograph and transmission grating spectrograph employed at Tokyo Institute of Technology to characterize EUV emission from the low current (<15 kA) and low energy (~ ten of Joule) pulsed plasma systems and some typical results.