Molecular beam epitaxy has been used to grow SrF 2 thin films on Si͑001͒. The growth modes have been investigated by atomic force microscopy, electron diffraction, and photoemission. Two principal growth regimes have been identified: ͑i͒ when deposition is carried out with the substrate held at a temperature of 700-750°C, SrF 2 molecules react with the substrate giving rise to a Sr-rich wetting layer on top of which three dimensional bulklike fluoride ridges develop; ͑ii͒ when deposition is carried out with the substrate held at 400°C, a nanopatterned film forms with characteristic triangular islands. Results are compared to the growth mode of CaF 2 on Si͑001͒ under analogous deposition conditions. Morphological and structural differences between the two systems are associated with the larger lattice parameter of SrF 2 with respect to CaF 2 , resulting in a larger mismatch with the Si substrate.