2004
DOI: 10.1016/j.nimb.2003.12.083
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Etched ion tracks in silicon oxide and silicon oxynitride as charge injection or extraction channels for novel electronic structures

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Cited by 65 publications
(24 citation statements)
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“…Very often such fabrication is based on the nuclear ion track etch method (NITEM), where selective etching of the latent ion tracks leading to the creation of pores with a large length-to-diameter ratio enables one to form porous templates. Moreover, deposition of nanorods onto semiconductor substrates and application of an additional electrode enables the introduction of such nanostructures to MOSFET-like electronic elements called the TEMPOS structures [3,4].…”
Section: Introductionmentioning
confidence: 99%
“…Very often such fabrication is based on the nuclear ion track etch method (NITEM), where selective etching of the latent ion tracks leading to the creation of pores with a large length-to-diameter ratio enables one to form porous templates. Moreover, deposition of nanorods onto semiconductor substrates and application of an additional electrode enables the introduction of such nanostructures to MOSFET-like electronic elements called the TEMPOS structures [3,4].…”
Section: Introductionmentioning
confidence: 99%
“…This holds especially for combining the present strategy with TEMPOS structures (i.e. Si/SiO 2 bilayer structures with etched ion tracks in the insulating SiO 2 cover layer) [24][25][26][27]. If these tracks were separated from the Si by a thin insulating membrane, they would also act as electrostatic bottles and thus enable the proposed biosensor strategy.…”
Section: Possible Further Technological Developments: Tempos Biosensorsmentioning
confidence: 99%
“…Furthermore, use of the ion-track technology is possible to select the most appropriate material for template according to required physical properties, such as polycarbonate, polyethylene terephthalate, polyimide, glass, and etc. [20][21][22].…”
Section: Introductionmentioning
confidence: 99%