Conventional photolithographic rapid
prototyping approaches typically
achieve reaction confinement in depth through patterned irradiation
of a photopolymerizable resin at a wavelength where the resin strongly
absorbs, such that only a very thin layer of material is solidified.
Consequently, three-dimensional objects are fabricated by progressive,
two-dimensional addition of material, curtailing fabrication rates
and necessitating the incorporation of support structures to ensure
the integrity of overhanging features. Here, we examine butyl nitrite
as a UV-active photoinhibitor of blue light-induced photopolymerizations
and explore its utilization to confine in depth the region polymerized
in a volume of resin. By employing two perpendicular irradiation patterns
at blue and near-UV wavelengths to independently effect either polymerization
initiation or inhibition, respectively, we enable three-dimensional
photopolymerization patterning in bulk resin, thereby complementing
emergent approaches to volumetric 3D printing.