2021 IEEE International Future Energy Electronics Conference (IFEEC) 2021
DOI: 10.1109/ifeec53238.2021.9661612
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ESD-capability Improvement of Ultra-high Voltage nLDMOS Components by the Drain Side Engineering

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“…[22], [23]. Metal silicide (titanium silicide or platinum silicide, for example), which is usually used as the contact layer in conventional integrated circuit process, on the top of lightly doped p-base will form the Schottky contact [24]- [27].…”
Section: Proposed Process Stepsmentioning
confidence: 99%
“…[22], [23]. Metal silicide (titanium silicide or platinum silicide, for example), which is usually used as the contact layer in conventional integrated circuit process, on the top of lightly doped p-base will form the Schottky contact [24]- [27].…”
Section: Proposed Process Stepsmentioning
confidence: 99%