Erosion of PFC materials induced by poroelectron emission

Kurnaev, V.А.; Tatarinova, N.V.

doi:10.1016/0022-3115(94)00615-6

Cited by 7 publications

(3 citation statements)

References 5 publications

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“…This potential is formed on several Debye's length that can be rather small in dense near-wall plasma. Thus, electric fields up to 10 7 V/m [1] can arise and generate prebreakdown currents. As far as there are no strong evidences that the reason of such currents is classical field emission due to field enhancement on sharp surface relief, it was named as low-field emission (LFE) [2].…”

Section: Introductionmentioning

confidence: 99%

Prebreakdown Currents From Tungsten Samples Covered With Thin Films

Sinelnikov

Kurnaev

Мамедов

2015

IEEE Trans. Plasma Sci.

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The results of current-voltage characteristics (CVCs) of low-field emission (LFE) measurement from tungsten cathodes covered by a thin (∼10 Å) discontinuous insulator film are presented. Such characteristics have a strong hysteresis effect and can be interpreted by switch-ON model. The current density of LFE is significantly higher than that of pure tungsten and comparable with that of tungsten fuzz nanostructure-the surface with high emissivity. The influence of water adsorption layers on the emission currents demonstrates increasing hysteresis effect in the CVCs in the case of cathode exposition under the injection without voltage applying in vacuum diode.Index Terms-Ion mass spectrometry, low-field emission (LFE), metal-insulator-vacuum structure, unipolar arcs.

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Section: Introductionmentioning

confidence: 99%

Prebreakdown Currents From Tungsten Samples Covered With Thin Films

Sinelnikov

Kurnaev

Мамедов

2015

IEEE Trans. Plasma Sci.

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“…Thus, strong electric fields can arise and generate the currents of so-called "low field emission" (LFE). For example, sheath potential for tokamaks varies from few to hundreds volts, but electric field strength depending on plasma density and electron temperature can be as high as 10 7 V/m [1]. Additional electron emission into plasma can change sheath potential, thus influencing plasma faced materials (PFM) by sputtering, and in some cases leads to the plasma-surface instabilities [2].…”

Section: Introductionmentioning

confidence: 99%

Emission properties of the plasma faced materials covered with thin films

Sinelnikov

Kurnaev

Мамедов

2014

2014 International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV)

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Electric field between the plasma and the plasma faced components can be high enough for appearance of prebreakdown currents measured in the experiments on vacuum insulation. In turn, thin insulating films on plasma faced surfaces can significantly change its emission properties and generate surface-plasma instabilities. In this paper, the results of current-voltage characteristic measurement accompanied with in situ diagnostics of the surfaces covered by non-metal films and water adsorption layers by using low angle ion spectroscopy are presented.

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“…This cffcct is particdarly notablc for porous clcctrodes with a low mccliaiiical strcngth [5][6][7].Thesc phcnomcna can be attributcd to the processes inside pores on thc cathode aiid anode surt'iccs. The changes in the pore ~tructure can markcilly influciicc the vacuuiii electric isolation cliaractcristics.…”

Section: Influence Of Size and Configuration Of Electrode Poresmentioning

confidence: 99%