2007
DOI: 10.1002/ctpp.200710068
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Erosion Behaviour of Metal‐Doped Carbon Layers in Deuterium Low Pressure Plasmas and the Determination by Optical Emission Spectroscopy

Abstract: The erosion behaviour of doped carbon materials was investigated in deuterium low pressure discharges. Therefore, amorphous carbon films on silicon substrates (film thickness ∼1 µm) with varying dopant species (V, Ti and W), dopant concentration (between 1 at% and 8.5 at%) and dopant distribution were exposed to the plasma. The dopant distribution is either atomically disperse or, by heating up to 1100 K, carbide grains in nm size are formed. All important plasma parameters are obtained by a combination of sev… Show more

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Cited by 4 publications
(13 citation statements)
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“…Unaffected by this, the relative yields are reliable as long as for the D γ and He signal constancy is shown, which was always proven [23]. Evaluating only the data above 1x10 24 The ion beam data reveal the same tendency of continuous decreasing (Fig.…”
Section: Resultsmentioning
confidence: 77%
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“…Unaffected by this, the relative yields are reliable as long as for the D γ and He signal constancy is shown, which was always proven [23]. Evaluating only the data above 1x10 24 The ion beam data reveal the same tendency of continuous decreasing (Fig.…”
Section: Resultsmentioning
confidence: 77%
“…Unfortunately, the plasma needs some time to stabilize, depending on thermal stabilization and material properties, like absorption, and the status of the vessel wall [23,25,26]. This leads to a large uncertainty of the yields for the presented measurement for the first fluences of 1x10 24 ions/m 2 after insertion of the specimen into the vacuum chamber.…”
Section: Resultsmentioning
confidence: 99%
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