Equipment design and process control of critical dimensions in lithography

Ngo, Yit Sung; Geng, Yun; Putra, Andi Sudjana; Ang, Keven; Tay, Arthur; Fang, Zhijie

doi:10.1109/icca.2010.5524378

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2012

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“…One of the primary use of ellipsometry is in the semiconductor manufacturing. In our previous work [3] we developed an in-situ spectroscopic ellipsometer which could perform real-time photoresist properties monitoring at PEB step. The ellipsometry measurement results demonstrated certain relationship regards to the PEB time and temperature.…”

Section: Introductionmentioning

confidence: 99%

Development of in-situ real-time CD monitoring and control system through PEB process

Geng

Tay

2012

2012 24th Chinese Control and Decision Conference (CCDC)

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Real-time control is the trend for photoresist processing in the advanced lithography. In this paper we develop an in-situ ellipsometer integrated with a programmable thermal heating system, which could perform real-time monitoring and control for critical dimension (CD) latent image through the entire post-exposure bake (PEB) process. The inline ellipsometry measurements are fitted into an electromagnetic wave model built on the rigorous coupled-wave analysis (RCWA) theory for CD latent image characterization. Thereafter a real-time control scheme is proposed by applying the programmable thermal bake-plate. The experimental outcome demonstrates a significant improvement on the final CD result comparing to the conventional baking method.

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Section: Introductionmentioning

confidence: 99%