EPR investigation of plasma-chemical resist etching in O2 and O2/CF4 discharges

Breitbarth, F. W.; Ducke, E.; Tiller, H.‐J.

doi:10.1007/bf01447199

Cited by 20 publications

(10 citation statements)

References 17 publications

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“…With increasing CF 4 content, large numbers of active fluorine‐containing species are generated, etching rate is increased, [ 22 ] and nano‐scale grooves was enlarged, [ 23,24 ] which resulting in higher roughness. [ 25‐27 ]…”

Section: Resultsmentioning

confidence: 99%

Plasma treatment of polymethyl methacrylate to improve surface hydrophilicity and antifouling performance

Sui

Shen

et al. 2020

Polymer Engineering & Sci

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Surface modification of polymethyl methacrylate (PMMA) by O2/CF4 plasma is investigated to improve hydrophilicity and antifouling performance of PMMA. The PMMA surface before and after treatment is characterized by atomic force microscopy, contact angle measurement, and X‐ray photoelectron spectroscopy. Antifouling properties are evaluated by protein adsorption and bacterial adhesion experiments using Staphylococcus aureus in vitro. Higher O2 content in the mixture gas promotes hydrophilicity of the plasma‐treated PMMA, while a hydrophobic surface forms at higher CF4 content. Modifying PMMA improves antifouling performance regardless of the O2/CF4 volume ratio, and this improvement increases with rising CF4 content in O2/CF4 plasma working gas. Functional groups CO and CF are detected in O2/CF4 plasma‐treated PMMA surface and the ratio of CO to CF can be controlled by the O2/CF4 volume ratio in the plasma working gas.

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Section: Resultsmentioning

confidence: 99%

Plasma treatment of polymethyl methacrylate to improve surface hydrophilicity and antifouling performance

Sui

Shen

et al. 2020

Polymer Engineering & Sci

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“…Cross linked PEG low-pressure glow plasma to coat the inner surface of soft tubular structures due to the pressure differences between the tube inside and outside which will distort the walls (d 'Agostino 1990;Ratner 1992;Yasuda 1985;Occhiello et al 1991;Suzuki et al 1986;Griesser et al 1994). The APGD system is useful in modifying materials by way of surface treatment, deposition, and surface etching similar to low pressure glow plasmas (Suwa et al 1996;Breitbarth et al 1990) even for inside of the fine tube. We report the application of APGD to fluorinate the inner surface of commercial poly(vinyl chloride) (PVC) tubes to enhance biocompatibility for a blood circulating tube.…”

Section: Binding Energy / Evmentioning

confidence: 99%

Low-temperature atmospheric discharge plasma and its applications for the surface treatment

Kogoma

Tanaka

2021

Rev. Mod. Plasma Phys.

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The atmospheric pressure low-temperature homogeneous discharge using helium and nitrogen, both known for industrial applications, was reviewed. In case of helium, metastable atoms (21s and 23s) produced in the glow discharge were able to dissociate mixed molecular gases to produce radicals or atoms. Radical species undergo chemical reactions, such as oxidation or nitration reaction and form products on the electrode surfaces. Applications of helium atmospheric pressure glow discharge including surface treatment of plastic films to enhance adhesibility with glue, weakening strength with pressure-sensitive glue, and deposition of solid material on a flat plate or powder surfaces, were described. Moreover, the microwave low-temperature discharge using nitrogen, as a cost-saving carrier gas, were introduced for the surface cleaning of silicon wafer.

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“…The oxygen atom mass flow was measured downstream using a titration technique [4][5][6]. This method is based on the following reactions:…”

Section: Titration Measurementsmentioning

confidence: 99%

“…As an independent method for measuring the oxygen atom mass flow we employed a titration technique [4][5][6]. We also used oxygen atom actinometry for monitoring ground state oxygen atoms in plasma.…”

Section: Introductionmentioning

confidence: 99%

“…More optimistic results have been reported by Granier et al [10] who showed that actinometry can be applied to monitor the atomic oxygen concentration in microwave surface wave discharges. Breithbarth et al [6] demonstrated the validity of actinometry in RF plasma in an external magnetic field. However, Collart et al [8] showed its invalidity under the same conditions.…”

Section: Introductionmentioning

confidence: 99%

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Atomic oxygen densities in a downstream microwave O₂/Ar plasma source

Ершов¹,

Borysow

2007

Plasma Sources Sci. Technol.

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An intense source of atomic oxygen is reported in this paper. Oxygen atoms were produced in an Ar/O 2 , 2.45 GHz, microwave discharge at flow rates ranging from 10 to 150 sccm and pressures from 0.5 to 4 Torr. The absolute flow rate of atomic oxygen peaked at 70 sccm which corresponded to a fractional dissociation close to 0.5. The atomic oxygen flow rate was measured using a titration method with NO 2 gas. It was also shown that the emission ratio from the 3p 3 P state of an oxygen atom at 844.6 nm and from the 3p 5 4p state of an argon atom at 750.4 nm was strongly correlated with oxygen atom to argon concentrations at some experimental conditions, e.g. modest Ar/O 2 flow ratios.

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EPR investigation of plasma-chemical resist etching in O2 and O2/CF4 discharges

Cited by 20 publications

References 17 publications

Plasma treatment of polymethyl methacrylate to improve surface hydrophilicity and antifouling performance

Plasma treatment of polymethyl methacrylate to improve surface hydrophilicity and antifouling performance

Low-temperature atmospheric discharge plasma and its applications for the surface treatment

Atomic oxygen densities in a downstream microwave O₂/Ar plasma source

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EPR investigation of plasma-chemical resist etching in O2 and O2/CF4 discharges

Cited by 20 publications

References 17 publications

Plasma treatment of polymethyl methacrylate to improve surface hydrophilicity and antifouling performance

Plasma treatment of polymethyl methacrylate to improve surface hydrophilicity and antifouling performance

Low-temperature atmospheric discharge plasma and its applications for the surface treatment

Atomic oxygen densities in a downstream microwave O2/Ar plasma source

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Product

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Atomic oxygen densities in a downstream microwave O₂/Ar plasma source