1996
DOI: 10.1006/spmi.1996.0115
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Epoxy bond and stop-etch (EBASE) technique enabling backside processing of (Al)GaAs heterostructures

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Cited by 62 publications
(48 citation statements)
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References 13 publications
(15 reference statements)
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“…To form the bottom electrode, the GaAs substrate was totally removed so that another NiCr electrode could be placed on the bottom in close proximity to the 2DHS (10000Å). Details of the substrate removal can be found elsewhere 12 . To measure the compressibility, we applied a 10 mV AC excitation voltage V ac to the bottom electrode (Gate 1), as shown in Fig.…”
Section: -10mentioning
confidence: 99%
“…To form the bottom electrode, the GaAs substrate was totally removed so that another NiCr electrode could be placed on the bottom in close proximity to the 2DHS (10000Å). Details of the substrate removal can be found elsewhere 12 . To measure the compressibility, we applied a 10 mV AC excitation voltage V ac to the bottom electrode (Gate 1), as shown in Fig.…”
Section: -10mentioning
confidence: 99%
“…Using our previously developed epoxy-bond-and-stop-etch (EBASE) technique [9] a pair of vertically aligned split gates is defined by electron beam lithography on each side of a double quantum well heterostructure whose thickness is only 0.8 pn. This use of close-proximity split gates on both sides of the epitaxial layers allows the width of each quantum wire to be independently controlled.…”
mentioning
confidence: 99%
“…In addition, (2) the energy of the transition can be readily controlled by a gate voltage and/or source drain bias VSD, which makes it possible to obtain a tunable THz detector. A more detailed discussion about the device operation and fabrication can be found in [16]- [21].…”
Section: Principle Of Operationmentioning
confidence: 99%
“…Then, the EBASE technique [21] is used to finish the fabricate of the DQW structure by adding front and back gates. Here, we briefly discuss the basic steps involved in the device fabrication as shown in Figure 3, and a more detailed discussion about the fabrication process is found in [21]. Tile first step is to grow the double quantum well epitaxial structure on a sacrificial substrate.…”
Section: Photon Photonmentioning
confidence: 99%